US 11,961,744 B2 · Substrate processing apparatus and substrate processing method

Abstract

In a chamber, first processing is performed as preliminary processing. After the first processing has been finished, the temperature in a predetermined target region in the chamber is measured with a thermographic camera. Then, whether or not to start second processing on a substrate is determined in accordance with the acquired measured temperature information. If it is determined as a result that the second processing can be started, the second processing is performed. In this case, the second processing on the substrate can be started, with the temperature of the target region in the chamber having reached its stability. Accordingly, the second processing can be performed uniformly on a plurality of substrates. That is, it is possible to reduce variations in processing caused by temperature environments in the chamber.

Claims16

Dependent claims

A substrate processing apparatus comprising:

a chamber;
a substrate holder that holds a substrate in said chamber;
a processing liquid supply part that supplies a processing liquid to a substrate held by said substrate holder in said chamber;
a first temperature measurement part that measures a temperature of a predetermined target region in said chamber;
and
a controller that controls said processing liquid supply part,
wherein said controller performs first processing for stabilizing a temperature environment in said chamber and determines whether or not to start a second processing that is performed by said liquid processing supply part, in accordance with measured temperature information acquired from said first temperature measurement part during or after said first processing.

4 more elements

Dependencies are inferred from the claim text.

Substrate processing apparatus and substrate processing method

Life of this patent

Substrate processing apparatus and substrate processing method

Life of this patent

Abstract

Claims16