Plasma generating device
AssigneeAtonarp Inc.
InventorNaoki Takahashi
Life of this patent
Estimating the term…
Abstract
A plasma generating device includes: a chamber which is equipped with a dielectric wall structure and into which sample gas to be measured flows; an RF supplying mechanism that generates plasma inside the chamber using an electric field and/or a magnetic field through the dielectric wall structure; and a floating potential supplying mechanism that includes a first electrode disposed along an inner surface of the chamber. The RF supplying mechanism may include an RF field forming unit disposed in a first direction with respect to the chamber and the first electrode may include an electrode disposed in a second direction with respect to the chamber.
Claims12
A gas analyzer apparatus comprising:
- a that generates microplasma and includes:
- a chamber which is equipped with a dielectric wall structure and into which gas to be plasmarized flows;
- an RF supplying mechanism that generates the plasma inside the chamber using an electric field and/or a magnetic field through the dielectric wall structure;
- and
- a floating potential supplying mechanism that includes a first electrode disposed along an inner surface of the chamber;
- a sampling unit that supplies a sample gas to be measured to the chamber;
- an analyzer unit that analyzes the sample gas via the generated plasma;
- and
- a potential control unit that controls a floating potential of the plasma using the floating potential supplying mechanism so that the plasma flows into the analyzer unit.
A control method of a gas analyzer apparatus,
- wherein the gas analyzer apparatus includes a generating device for microplasma into which sample gas to be measured flows and an analyzer unit that analyzes the sample gas via plasma generated by the generating device, and the generating device includes:
- a chamber which is equipped with a dielectric wall structure and into which the sample gas flows;
- an RF supplying mechanism that generates the plasma inside the chamber using an electric field and/or a magnetic field through the dielectric wall structure;
- and a floating potential supplying mechanism that includes a first electrode disposed along an inner surface of the chamber,
- and the method comprises controlling a floating potential of the plasma with the floating potential supplying mechanism so that the plasma flows into the analyzer unit.
Dependencies are inferred from the claim text.