Surface-assisted laser desorption/ionization method, mass spectrometry method and mass spectrometry device
AssigneeHamamatsu Photonics K.K.
InventorsYasuhide Naito, Masahiro Kotani, Takayuki Ohmura
Life of this patent
Estimating the term…
Loading patent…
AssigneeHamamatsu Photonics K.K.
InventorsYasuhide Naito, Masahiro Kotani, Takayuki Ohmura
Estimating the term…
A surface-assisted laser desorption/ionization method according to an aspect includes: a first process of preparing a sample support (2) having a substrate (21) in which a plurality of through-holes (S) passing from one surface (21a) thereof to the other surface (21b) thereof are provided and a conductive layer (23) that covers at least the one surface (21a); a second process of placing a sample (10) on a sample stage (1) and arranging the sample support (2) on the sample (10) such that the other surface (21b) faces the sample (10); and a third process of applying a laser beam (L) to the one surface (21a) and ionizing the sample (10) moved from the other surface (21b) side to the one surface (21a) side via the through-holes (S) due to a capillary phenomenon.
A sample support for ionizing a sample, comprising:
A sample support for ionizing a sample, comprising:
A sample support for ionizing a sample, comprising
A sample support for ionizing a sample, comprising
Dependencies are inferred from the claim text.