Device for detecting plasma of ultra fast with multi channel

A multi-channel device for detecting plasma at an ultra-fast speed, comprising:

• a first antenna module connected to a first output terminal in contact with a substrate on a chuck of a process chamber and extending to ground, and receiving a first leakage current leaking through the substrate to increase reception sensitivity of the first leakage current;
• a first current detection module detecting the first leakage current;
• a current measurement module receiving the first leakage current output from the first current detection module, and extracting the received first leakage current for each predetermined period to generate a first leakage current measurement information;
• a control module comparing the first leakage current measurement information with a reference value to generate first arcing occurrence information;
• a second antenna module connected to a second output terminal extending from the chuck to the ground, and receiving a second leakage current leaking from the chuck to increase reception sensitivity of the second leakage current, after power is supplied to warm the chuck;
• a filter module connected to a rear end of the second antenna module and removing noise from the second leakage current output from the second antenna module;
• and
• a second current detection module detecting the second leakage current.

A multi-channel device for detecting plasma at an ultra-fast speed, comprising:

• a first antenna module connected to a first output terminal in contact with a substrate on a chuck of a process chamber and extending to ground, and receiving a first leakage current leaking through the substrate to increase reception sensitivity of the first leakage current;
• a first current detection module detecting the first leakage current;
• a current measurement module receiving the first leakage current output from the first current detection module, and extracting the received first leakage current for each predetermined period to generate a first leakage current measurement information;
• a control module comparing the first leakage current measurement information with a reference value to generate first arcing occurrence information;
• a second antenna module connected to a second output terminal extending from the chuck to the ground, and receiving a second leakage current leaking from the chuck to increase reception sensitivity of the second leakage current, after power is supplied to warm the chuck;
• a filter module connected to a rear end of the second antenna module and removing noise from the second leakage current output from the second antenna module;
• and
• a second current detection module detecting the second leakage current,
• wherein the process chamber further includes:
• a view port formed to enable an inner space of the process chamber to be checked from the outside;
• an optical detection module collecting plasma optical information on a state of the plasma generated in the inner space of the process chamber through the view port;
• and
• an optical measurement module receiving the plasma optical information to generate optical measurement information thereon;
• wherein the current measurement module receives the second leakage current output from the second current detection module, and extracts the received second leakage current for each predetermined period to generate second leakage current measurement information,
• wherein the control module compares the optical measurement information with an optical reference value to generate third arcing occurrence information;
• the control module compares the second leakage current measurement information with the second reference value to generate second arcing occurrence information, and
• the control module compares at least two information of the first arcing occurrence information, the second arcing occurrence information and the third arcing occurrence information with each other to generate fourth arcing occurrence information of finally determining whether the arcing occurs based on whether the two information match with each other.