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US 11,961,714 B2Granted
Substrate processing apparatus
AssigneeLinco Technology Co., Ltd.
InventorsYi-Yuan Huang, Yi-Cheng Liu
Life of this patent
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Abstract
A substrate processing apparatus comprises a chamber member that defines an interior volume that has an aspect ratio. The chamber member comprises a pair of laterally opposing inlet walls and a loading port. Each of the pair of laterally opposing inlet walls has an inlet port configured to receive output from a remote plasma source. The loading port is arranged between the pair of inlet walls, configured to allow passage of a substrate into the interior volume.
Claims19
A substrate processing apparatus, comprising:
- a chamber member that defines an interior volume having an aspect ratio, the chamber member comprising:
- a pair of laterally opposing inlet walls, each one of the pair of inlet walls having an inlet port that is configured to receive output from a remote plasma source and having a first geometric planner profile, and
- a loading port arranged laterally between the pair of inlet walls, and configured to allow passage of a substrate into the interior volume, wherein:
- each one of the pair of inlet walls is provided with a distributing hole pattern arranged toward the interior volume of the chamber member,
- a central region of the distributing hole pattern projectively overlaps the inlet port,
- the central region has a second geometric planner profile, and
- the first geometric planner profile is different from the second geometric planner profile.
4 more elements
A substrate processing apparatus, comprising:
- a chamber member that defines an interior volume having an aspect ratio not greater than 1, the chamber member comprising:
- a pair of laterally opposing inlet walls, each one of the pair of inlet walls having an inlet port and having a first geometric planner profile;
- and,
- a loading port arranged laterally between the pair of inlet walls, and configured to allow passage of a vertically oriented substrate carrier having a retaining frame body into the interior volume;
- and
- a pair of remote plasma sources respectively arranged laterally over the pair of inlet walls, each one of the pair of remote plasma sources being accessible through inlet ports on the pair of inlet walls, wherein:
- the inlet ports are configured to receive output from the pair of remote plasma sources,
- each one of the pair of inlet walls is provided with a distributing hole pattern arranged toward the interior volume of the chamber member,
- a central region of the distributing hole pattern projectively overlaps the inlet port,
- the central region has a second geometric planner profile, and
- the first geometric planner profile is different from the second geometric planner profile.
8 more elements
Dependencies are inferred from the claim text.