Plasma processing apparatus

A plasma processing apparatus comprising:

• a balun including a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal;
• a grounded vacuum container formed by a conductor;
• a first electrode electrically connected to the first balanced terminal;
• a second electrode electrically connected to the second balanced terminal;
• an impedance matching circuit;
• a first power supply connected to the balun via the impedance matching circuit, and configured to supply a high frequency to the first electrode via the impedance matching circuit and the balun;
• a low-pass filter;
• and
• a second power supply configured to supply a voltage to the first electrode via the low-pass filter;
• wherein the balun includes a first coil configured to connect the first unbalanced terminal and the first balanced terminal, and a second coil configured to connect the second unbalanced terminal and the second balanced terminal.