Replaceable module for a charged particle apparatus

A charged particle apparatus comprising a field replaceable module for supporting a device configured to manipulate paths of charged particles in a charged particle apparatus, the module comprising:

• a module flange configured to attach to, and detach from, a housing flange of a housing of the charged particle apparatus such that the module is field replaceable in the charged particle apparatus,
• wherein, when the module is in use in the charged particle apparatus with the module comprising and supporting a charged particle optical device, the charged particle optical device is configured to manipulate a charged particle path that is substantially along a charged particle axis of the charged particle apparatus;
• and
• wherein the charged particle axis corresponds to a z-axis;
• and the module is a substantially planar structure in an x-y plane;
• wherein the module comprises:
• a device support for supporting the charged particle optical device;
• and
• a mechanism for adjusting a position of the device support in at least one degree of freedom of movement,
• wherein the mechanism for adjusting the position of the device support comprises one or more adjustable supports, and is configured to be operated when the module is outside of the charged particle apparatus, wherein one or more of the adjustable supports are configured to be inside the charged particle apparatus when the module is inside the charged particle apparatus.

A method of aligning an electron-optical device with a charged particle beam, or multi-beam, within a charged particle apparatus, the method comprising:

• adjusting a position of an electron-optical device in a module comprising the electron-optical device when the module is outside of a charged particle apparatus;
• securing the module comprising the electron-optical device to the charged particle apparatus to thereby install the electron-optical device in the charged particle apparatus;
• applying fine adjustment(s) to an x-position, y-position and/or Rz state of the installed electron optical device relative to a main body of the module;
• and
• applying an adjustment to a path of a charged particle beam, or multi-beam, within the charged particle apparatus.