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US 11,961,695 B2Granted
Substrate treating apparatus, ion implantation apparatus, and ion implantation method
AssigneeSemes Co., Ltd.
InventorsDoyeon Kim, Hyun Yoon, Ho Jong Hwang
Life of this patent
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Abstract
An apparatus for treating a substrate includes a process chamber that performs a liquid treatment process by dispensing a treatment liquid onto the substrate, and components provided in the process chamber. A surface of at least one of the components is formed of a material containing an ion-implanted fluorine resin.
Claims20
An apparatus for treating a substrate, the apparatus comprising:
- a process chamber configured to perform a liquid treatment process by dispensing a treatment liquid onto the substrate;
- and
- wherein the process chamber includes a plurality of components which are touched by the treatment liquid, and
- wherein at least one of the plurality of components includes fluorine resin and has a surface implanted with ions.
1 more element
An apparatus for treating a substrate, the apparatus comprising:
- a treatment vessel having a treatment space;
- a support unit configured to support the substrate in the treatment space, the support unit having a support plate;
- and
- a liquid dispensing unit including a nozzle configured to dispense a treatment liquid onto the substrate supported on the support unit,
- wherein at least one of the treatment vessel, the support plate, or the nozzle is formed of a material containing a fluorine resin or plastic, and a surface of the at least one of the treatment vessel, the support plate, and the nozzle is implanted with ions, and
- wherein the at least one of the treatment vessel, the support plate, and the nozzle implanted with ions is configured to prevent static electricity being generated.
3 more elements
An apparatus for treating a substrate, the apparatus comprising:
- a treatment vessel having a treatment space;
- a support unit configured to support the substrate in the treatment space, the support unit having a support plate;
- and
- a liquid dispensing unit including a nozzle configured to dispense a treatment liquid onto the substrate supported on the support unit,
- wherein the treatment vessel and the support plate are formed of a material containing a fluorine resin and are implanted with ions to have a surface resistance, per unit distance, of 1 M Ohms to 1 G Ohms.
2 more elements
Dependencies are inferred from the claim text.