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US 11,960,210 B2Granted
Laser interference fringe control for higher EUV light source and EUV throughput
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChansyun David Yang, Keh-Jeng Chang, Chan-Lon Yang
Life of this patent
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Abstract
A method for generating an extreme ultraviolet (EUV) radiation includes simultaneously irradiating two or more target droplets with laser light in an EUV radiation source apparatus to produce EUV radiation and collecting and directing the EUV radiation produced from the two or more target droplet by an imaging mirror.
Claims20
An extreme ultraviolet (EUV) radiation source, comprising:
- a laser source configured to generate an excitation laser beam;
- a beam splitter configured to divide the excitation laser beam into two laser beams;
- and
- a droplet generator including multiple nozzles configured to simultaneously release multiple droplets in parallel,
- wherein the EUV radiation source is configured such that the two laser beams generate parallel bright fringes at a zone of excitation and the multiple droplets are irradiated by the bright fringes.
2 more elements
A pattern formation method comprising:
- providing a substrate coated with a photoresist layer;
- exposing the photoresist layer with an extreme ultraviolet (EUV) light reflected by a photomask,
- wherein the EUV light is generated by:
- causing an excitation laser beam to generate bright fringes at a zone of excitation by interference using two slit openings;
- generating multiple target droplets simultaneously;
- and
- generating the EUV light by irradiating the multiple target droplets with the bight bright fringes.
4 more elements
An extreme ultraviolet (EUV) radiation source, comprising:
- a laser source configured to generate a pre-pulse laser beam and a main-pulse laser beam;
- and
- a droplet generator including multiple nozzles configured to simultaneously release multiple droplets in parallel,
- wherein the extreme ultraviolet (EUV) radiation source is configured such that at least one of the pre-pulse laser beam or the main-pulse laser beam causes bright fringes at a zone of excitation by interference, and the multiple droplets are irradiated by the bright fringes.
1 more element
Dependencies are inferred from the claim text.