Developing treatment method and developing treatment apparatus

A developing treatment method for performing a developing treatment on a resist film on a substrate, the developing treatment method comprising:

• (A) supplying a developing solution to the substrate and developing the resist film to form a resist pattern;
• (B) supplying a water-based cleaning liquid to the developed substrate to clean the substrate with the water-based cleaning liquid;
• (C) applying an aqueous solution of a water-soluble polymer to the substrate cleaned with the water-based cleaning liquid to form a hydrophilic layer having a hydrophilic property on a surface of the substrate;
• and
• (D) cleaning the substrate on which the hydrophilic layer has been formed, with a rinse liquid,
• the (B) comprising:
• (a) accelerating a rotation speed of the substrate;
• and
• (b) after the (a), decelerating the rotation speed of the substrate until a start of the (C), and
• the (C) comprising:
• (e) rotating the substrate while supplying the aqueous solution of the water-soluble polymer to the substrate cleaned with the water-based cleaning liquid;
• and
• after the (e), maintaining a rotation of the substrate in a state of not supplying the aqueous solution of the water-soluble polymer, wherein
• the aqueous solution of the water-soluble polymer and the rinse liquid are acidic, and wherein
• an execution time of the maintaining the rotation is longer than an execution time of the (e).