Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device

A photoresist composition, comprising:

• an acid-sensitive polymer,
• a solvent, and
• a photoacid generator compound having Formula (III):
• wherein:
• X5 and X6 are each independently an electron withdrawing group selected from C(CN)2, C(NO2)2, C(COR27)2, C(CO2R28)2, C(SO2R29)2, and C(Rf)2, wherein R27, R28, and R29 are each independently a C1-30 aliphatic organic group, a C6-30 aromatic organic group, or a C1-30 heteroaromatic organic group, and wherein Rf is a C1-30 fluoroalkyl group;
• Z1 and Z2 are each independently hydrogen, a straight chain C1-50 alkyl group, a branched C3-50 alkyl group, a monocyclic or polycyclic C3-50 cycloalkyl group, a monocyclic or polycyclic C3-50 heterocycloalkyl group;
• a monocyclic or polycyclic C6-50 aryl group, a monocyclic or polycyclic C3-20 heteroaryl group, or a combination thereof;
• Y is a single bond or a linking group;
• R is hydrogen;
• and
• M+ is an organic cation;
• provided that the anion of the photoacid generator compound does not simultaneously include three electron-withdrawing —S(═O)2-perfluoroalkyl groups.