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US 11,960,202 B1Granted
EUV mask defect tool apparatus
AssigneeEuv Tech, Inc.
InventorsChami N Perera, David C. Houser, Charles G. Murray, Alexander N. Khodarev, Travis W. Grodt
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Abstract
An EUV microscope device utilizing a source of a beam of EUV light. The light is sent to a collector which produces a first focused EUV beam. A monochromator receives the first focused EUV beam and produces a second EUV beam that is passed to an illumination module. The output of the illumination module is passed to a mask. The reflected beam from the mask is sent to a zone plate and a detector to produce an image.
Claims10
An EUV microscope device for analyzing mask defects, comprising:
- a source of a beam of EUV light;
- a collector for said beam of EUV light, said collector providing a first focused EUV beam;
- a monochromator, said monochromator receiving said first focused EUV beam to produce a second EUV beam of a certain focus and linear dispersion;
- an illumination module, said illumination module receiving said second EUV beam from said monochromator and producing a reimaged EUV beam, said reimaged EUV beam being directed to the mask for reflection therefrom;
- a zone plate, said zone plate including a central obscuration, said zone plate receiving said EUV beam reflected from the mask and passing a certain order of said reflected EUV beam;
- and
- a detector for receiving said certain order of reflected EUV beam and producing an image thereof.
4 more elements
Dependencies are inferred from the claim text.