Meta-lens structure and method of fabricating the same

A method of fabricating a meta-lens structure, the method comprising:

• forming a first dielectric layer in contact with a silicon wafer;
• forming a second dielectric layer in contact with the first dielectric layer, a refractive index of the second dielectric layer different from a refractive index of the first dielectric layer;
• patterning the second dielectric layer;
• and
• removing at least a portion of the silicon wafer to expose the first dielectric layer,
• wherein the silicon wafer is entirely removed;
• wherein the method further comprises forming a layer of silicon oxide in contact with the second dielectric layer after the second dielectric layer is patterned and before the silicon wafer is entirely removed;
• and
• wherein the method also comprises bonding a wafer to the silicon oxide layer after the silicon oxide layer is formed, and before the silicon wafer is entirely removed.