Ligand, ligand quantum dot, quantum dot layer and method for patterning the same
AssigneeBoe Technology Group Co., Ltd.
InventorsWenhai Mei, Zhenqi Zhang, Aidi Zhang, Xiaoyuan Zhang, Haowei Wang
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AssigneeBoe Technology Group Co., Ltd.
InventorsWenhai Mei, Zhenqi Zhang, Aidi Zhang, Xiaoyuan Zhang, Haowei Wang
Estimating the term…
The present disclosure relates to a ligand for a quantum dot, a ligand quantum dot, a quantum dot layer and a method for patterning the same. The surface of the ligand quantum dot of the present disclosure is connected with the cleavage-type ligand including a first ligand unit A, a cleavage unit B, and an adhesion adjusting unit C. The method includes: providing a substrate; coating a mixture containing the ligand quantum dot on the substrate to form a quantum dot film; exposing a preset region of the quantum dot film to ultraviolet light, so that the cleavage unit B in the cleavage-type ligand undergoes a photolysis reaction, and a molecular segment containing the adhesion adjusting unit C and obtained after decomposition is detached from a surface of the quantum dot; and washing off an unexposed region of the quantum dot film with an organic solvent, followed by drying.
A cleavage-type ligand for quantum dots, having any one of structures shown in the following Formulas I and V to IX:
Dependencies are inferred from the claim text.