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US 11,958,164 B2Granted
Stepped retaining ring
AssigneeApplied Materials, Inc.
InventorsShaun Van Der Veen, Steven M. Zuniga
Life of this patent
Estimating the term…
Abstract
A two part retaining ring is described. A rigid upper portion has an annular recess along its inner diameter. An annular wearable lower portion has an inner diameter, an annular extension defined by the inner diameter and a vertical wall that is perpendicular to a surface of the second portion and opposite to the inner diameter. The annular extension fits into the annular recess of the annular first portion. A bonding material is on the vertical wall of the annular second portion.
Claims5
A retaining ring of a carrier head of a polishing apparatus, the retaining ring comprising:
- an annular lower portion of a first material, the lower portion having a lower surface to contact a polishing pad;
- and an annular upper portion of a different second material, the upper portion having an upper surface configured to attach to the carrier head, wherein the lower portion is bonded to the upper portion by a bonding layer along an interface between the lower portion and the upper portion, wherein the interface includes a step adjacent to the inner diameter of the retaining ring and wherein a remainder of the interface between the step and the outer diameter of the retaining ring is flat with the bonding layer having uniform thickness.
Dependencies are inferred from the claim text.