CMP pad construction with composite material properties using additive manufacturing processes

A composite polishing pad, comprising:

• a base material layer;
• and
• a plurality of features extending from the base material layer to form a polishing surface, wherein
• the plurality of features and a surface of the base material layer define one or more channels disposed between the features,
• a plurality of pores are arranged in the plurality of features, and
• the plurality of features comprise a first material composition formed from a mixture of least two different droplet compositions and the base material layer comprises a second material composition different from the first material composition.

A polishing pad, comprising:

• a base material layer;
• and
• a plurality of features extending from the base material layer to form a polishing surface, wherein
• the plurality of features comprise a first material composition formed from a mixture of at least two different droplet compositions,
• the base material layer comprises a second material composition different from the first material composition, and
• the base material layer and the plurality of features are formed by sequentially deposited layers and are joined together during curing of the sequentially deposited layers.

A composite polishing pad, comprising:

• a base material layer formed of an acrylate;
• and
• a plurality of features extending from the base material layer to form a polishing surface, wherein
• the plurality of features and a surface of the base material layer define one or more channels disposed between the features,
• a plurality of pores are arranged in a pattern in the plurality of features, and
• the base material layer and the plurality of features are formed by sequentially deposited layers and are joined together during curing of the sequentially deposited layers.