Substrate processing method and substrate processing apparatus

A substrate processing method comprising:

• a sulfuric acid immersing step of immersing a plurality of substrates in a sulfuric acid-containing liquid within a sulfuric acid vessel;
• a transporting step of taking out the substrates from the sulfuric acid vessel and transporting the substrates to an ozone gas treatment unit;
• and
• an ozone exposing step of exposing the substrates transported to the ozone gas treatment unit to an ozone-containing gas,
• wherein the sulfuric acid immersing step includes a vertical immersing step of immersing the substrates in the sulfuric acid-containing liquid within the sulfuric acid vessel while holding the substrates in a vertical attitude,
• the substrate processing method further comprising an attitude changing step of changing attitude of the substrates taken out of the sulfuric acid vessel from the vertical attitude to a horizontal attitude,
• wherein the ozone exposing step includes a horizontal exposing step of exposing the substrates to the ozone-containing gas while holding the substrates in the horizontal attitude.