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US 11,953,833 B2Granted
Compound, substrate for pattern formation, photodegradable coupling agent, pattern formation method, and transistor production method
AssigneeNikon Corporation
InventorsYusuke Kawakami, Kazuo Yamaguchi, Michiko Itou
Life of this patent
Estimating the term…
Abstract
A compound represented by Formula (1). [In the formula, X represents a halogen atom or an alkoxy group, R1 represents any one group selected from an alkyl group having 1 to 5 carbon atoms, a group represented by Formula (R2-1), and a group represented by Formula (R2-2), R2 represents a group represented by Formula (R2-1) or (R2-2), n0 represents an integer of 0 or greater, n1 represents an integer of 0 to 5, and n2 represents a natural number of 1 to 5.]
Claims14
A compound represented by Formula (1)
- [in the formula, X represents a halogen atom or an alkoxy group, R1 represents any one group selected from an alkyl group having 1 to 5 carbon atoms, a group represented by Formula (R2-1), and a group represented by Formula (R2-2), R2 represents a group represented by Formula (R2-1) or (R2-2), n0 represents an integer of 0 or greater, n1 represents an integer of 0 to 5, and n2 represents a natural number of 1 to 5]
- [in the formulae, R21 and R22 each independently represents an alkyl group having 1 to 5 carbon atoms, n represents a natural number, and the wavy line represents a bonding site].
Dependencies are inferred from the claim text.