Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
AssigneeASM IP Holding B.V.
InventorsKatja Väyrynen, Timo Hatanpää, Mikko Ritala, Markku Leskelä
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Abstract
A method of depositing a metal-containing material is disclosed. The method can include use of cyclic deposition techniques, such as cyclic chemical vapor deposition and atomic layer deposition. The metal-containing material can include intermetallic compounds. A structure including the metal-containing material and a system for forming the material are also disclosed.
Claims20
A cyclic deposition process for depositing an intermetallic compound, the cyclic deposition method comprising the steps of:
- providing a first gas-phase reactant comprising a first metal from a first gas-phase reactant source vessel to a reaction chamber to react with a surface of a substrate to form a first metal species;
- and
- providing a second gas-phase reactant comprising a second metal to the reaction chamber to react with the first metal species to thereby form the intermetallic compound,
- wherein the first gas-phase reactant comprises a group 3-group 12 metal and an adduct forming ligand, and
- wherein the second gas-phase reactant comprises a metal-containing organic compound.
A cyclic deposition process for forming a metal-containing material, the cyclic deposition process comprising:
- providing a first gas-phase precursor comprising a first metal to a reaction chamber from a first gas-phase reactant source vessel to form a first metal species;
- and
- providing a second gas-phase reactant comprising a compound having a general formula of R-M-H, wherein R is an organic group and M is a metal to react with the first metal species to thereby form the metal-containing material,
- wherein a temperature within the reaction chamber is greater than 0° C. and less than 600° C.,
- wherein the first gas-phase precursor comprises a metal compound comprising an adduct-forming ligand, and
- wherein the first metal comprises a group 2 to group 12 metal.
Dependencies are inferred from the claim text.