Sputtering reaction chamber and process assembly of sputtering reaction chamber

A sputtering reaction chamber comprising:

• a chamber body;
• a base arranged in the chamber body;
• and
• a process assembly including:
• a liner including:
• a body member being in a ring shape and arranged on an inner cider of a sidewall of the chamber body;
• and
• a cover member integrally formed with the body member, extending from a bottom of the body member along a radial direction of the body member, and configured to fix a to-be-processed workpiece placed over the base when a process is performed, wherein:
• a cooling channel is arranged in the cover member and the body member and includes a first cooling channel in the body member and a second cooling channel in the cover member, the first cooling channel communicating with the second cooling channel;
• a deposition ring, wherein the cover member and the deposition ring cooperate with each other to form a labyrinth channel,
• the deposition ring including:
• a deposition member arranged radially with a bottom surface on top of the base and configured to contact with and support an outer edge of the to-be-processed workpiece;
• a deposition-ring convex member arranged axially, and
• a deposition-ring concave groove between the deposition-ring convex member and the deposition member;
• wherein
• the cover member includes a cover-member concave member in a ring shape corresponding to, and cooperating with, the deposition-ring convex member, and
• the cover member further includes a cover-member convex member with an inner ring sidewall inserted into the deposition-ring concave groove to form the labyrinth channel.