Polishing pads with interconnected pores
AssigneeApplied Materials, Inc.
InventorsShiyan Akalanka Jayanath Wewala Gonnagahadeniyage, Ashwin Chockalingam, Jason Garcheung Fung, Veera Raghava Reddy Kakireddy, Nandan Baradanahalli Kenchappa, Puneet Narendra Jawali, Rajeev Bajaj
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