Methods and apparatuses for adjusting beam condition of charged particles
AssigneeASML Netherlands B.V.
InventorXuedong Liu
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Abstract
Apparatus and methods for adjusting beam condition of charged particles are disclosed. According to certain embodiments, the apparatus includes one or more first multipole lenses displaced above an aperture, the one or more first multipole lenses being configured to adjust a beam current of a charged-particle beam passing through the aperture. The apparatus also includes one or more second multipole lenses displaced below the aperture, the one or more second multipole lenses being configured to adjust at least one of a spot size and a spot shape of the beam.
Claims20
An apparatus comprising:
- one or more first non-rotational axially-symmetric lenses displaced above an aperture, the one or more first non-rotational axially-symmetric lenses being configured to adjust a beam current of a charged-particle beam passing through the aperture;
- and
- one or more second non-rotational axially-symmetric lenses displaced below the aperture, the one or more second non-rotational axially-symmetric lenses being configured to adjust at least one of a spot size or a spot shape of the charged particle beam.
A non-transitory computer-readable medium that stores a set of instructions that is executable by at least one processor of an apparatus to cause the apparatus to perform a method comprising:
- controlling one or more first non-rotational axially-symmetric lenses displaced above an aperture, to adjust a beam current of a charged-particle beam passing through the aperture;
- and
- controlling one or more second non-rotational axially-symmetric lenses displaced below the aperture, to adjust at least one of a spot size or a spot shape of the charged-particle beam.
Dependencies are inferred from the claim text.