Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition

A polymer comprising repeat units derived from a monomer having a structure

• wherein,
• R is an organic group consisting of (A) a polymerizable carbon-carbon double bond or carbon-carbon triple bond group selected from the group consisting of C2-12 alkenyl, C2-12 alkynyl, acryloyl, 2-(C1-12-alkyl)acryloyl, 2-(C1-12-fluoroalkyl)acryloyl, 2-cyanoacryloyl, and 2-fluoroacryloyl, and (B) one or more divalent groups selected from a straight chain or branched non-fluorinated C1-20 alkylene group, a monocyclic or polycyclic non-fluorinated C3-20 cycloalkylene group, a monocyclic or polycyclic C3-20 heterocycloalkylene group, a monocyclic or polycyclic C6-20 arylene group, a monocyclic or polycyclic C1-20 heteroarylene group, and a combination thereof;
• wherein the C1-20 alkylene group, C3-20 cycloalkylene group, the monocyclic or polycyclic C3-20 heterocycloalkylene group, the monocyclic or polycyclic C6-20 arylene group, and the monocyclic or polycyclic C1-20 heteroarylene group are optionally substituted with at least one monovalent substituent selected from chlorine, bromine, iodine, hydroxyl, amino, thiol, carboxyl, carboxylate, amide, nitrile, nitro, C1-18 alkyl, C1-18 alkoxyl, C6-18 aryl, C6-18 aryloxyl, C7-18 alkylaryl, or C7-18 alkylaryloxyl;
• X and Y are independently at each occurrence hydrogen or a non-fluorinated non-hydrogen substituent;
• EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group;
• p is 1, 2, 3, or 4;
• n is 2, 3, or 4;
• and
• M+ is an organic cation.