Hot showerhead

A substrate processing chamber, comprising:

• an isolator;
• an annular spacer positioned atop the isolator;
• a manifold seated atop the isolator and positioned within an interior of the annular spacer, wherein:
• a top surface of the manifold is at a lower height than a top portion of the annular spacer;
• and
• the manifold defines a plurality of apertures therethrough;
• and
• the top surface of the manifold and a bottom surface of the manifold comprise a conductive material;
• and
• a plurality of pins positioned between the isolator and the manifold, wherein the plurality of pins elevate the bottom surface of the manifold above a top surface of the isolator such that a gap is formed between the bottom surface of the manifold and the top surface of the isolator.

A substrate processing chamber, comprising:

• an isolator comprising an inner edge that defines an open interior, wherein the isolator comprises an electrically insulating material;
• an annular spacer positioned atop the isolator, wherein:
• an inner portion of a bottom surface of the annular spacer protrudes below an outer portion of the bottom surface of the annular spacer such that a gap is formed between the outer portion of the bottom surface of the annular spacer and a top surface of the isolator;
• and
• an inner edge of the outer portion is disposed radially outward from the inner edge of the isolator;
• and
• a manifold seated atop the isolator and positioned within an interior of the annular spacer, wherein a top surface of the manifold is at a lower height than a top portion of the annular spacer.