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US 11,945,894 B2Granted
Dielectric film-forming composition
AssigneeFujifilm Electronic Materials U.S.A., Inc.
InventorsBinod B. De, William A. Reinerth, Sanjay Malik, Stephanie Dilocker, Raj Sakamuri
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Abstract
This disclosure relates to a dielectric film-forming composition that includes at least one cyclized polydiene resin, and one or both of at least one reactive functional compound and at least one catalyst.
Claims14
A dielectric film-forming composition, comprising:
- a) at least one cyclized polydiene resin having a substituted or unsubstituted alkenyl group;
- b) at least one reactive functional compound having at least two functional groups capable of reacting with the substituted or unsubstituted alkenyl group on cyclized polydiene resin;
- and
- c) at least one catalyst capable of inducing reaction of the cyclized polydiene resin with the reactive functional compound,
- wherein the at least one cyclized polydiene resin is in an amount of from about 2 wt % to about 40 wt % of the composition.
2 more elements
A dielectric film-forming composition, comprising:
- a) at least one cyclized polydiene resin;
- and
- b) at least one cyanate ester compound, the at least one cyanate ester compound comprising at least two cyanate groups.
A dielectric film-forming composition, comprising:
- a) at least one cyclized polydiene resin having a substituted or unsubstituted alkenyl group;
- b) at least one reactive functional compound having at least two functional groups capable of reacting with the substituted or unsubstituted alkenyl group on the cyclized polydiene resin;
- c) at least one cyanate ester compound, the at least one cyanate ester compound comprising at least two cyanate groups;
- d) at least one catalyst capable of inducing reaction of the cyclized polydiene resin with the reactive functional compound;
- and
- e) optionally, at least one solvent.
3 more elements
Dependencies are inferred from the claim text.