Additive manufacturing of inverse-designed metadevices
AssigneeNorthwestern University
InventorsKoray Aydin, Francois Callewaert, Alan Varteres Sahakian
Life of this patent
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Abstract
A method for creating metadevices includes receiving, at a computing device, one or more boundary conditions for a metadevice. The method also includes processing, with an inverse-design algorithm stored in a memory of the computing device, the one or more boundary conditions to generate a metadevice structure design that satisfies the one or more boundary conditions. The method also includes converting, by a processor of the computing device, the metadevice structure design into a file that is compatible with an additive manufacturing device. The method further includes providing the file of the metadevice structure design to the additive manufacturing device.
Claims18
A method for creating metadevices, the method comprising:
- receiving, at a computing device, a desired output electromagnetic field distribution for a metadevice;
- determining, with an inverse-design algorithm stored in a memory of the computing device, an electric field and a dielectric permittivity for a metadevice structure design that satisfies the desired output electromagnetic field distribution;
- converting, by a processor of the computing device, the metadevice structure design into a file that is compatible with an additive manufacturing device;
- providing the file of the metadevice structure design to the additive manufacturing device;
- and
- creating, by the additive manufacturing device, the metadevice that satisfies the desired output electromagnetic field distribution.
A system for generating metadevices, the system comprising:
- a memory configured to store an inverse-design algorithm;
- an interface configured to receive a desired output electromagnetic field distribution for a metadevice;
- and
- a processor operatively coupled to the memory and the interface, wherein the processor is configured to:
- use the inverse-design algorithm to determine an electric field and a dielectric permittivity for a metadevice structure design that satisfies the desired output electromagnetic field distribution;
- convert the metadevice structure design into a file that is compatible with an additive manufacturing device;
- and
- wherein the processor is further configured to provide the file of the metadevice structure design to the additive manufacturing device, and further comprising the additive manufacturing device, wherein the additive manufacturing device is configured to create the metadevice that satisfies the desired output electromagnetic field distribution.
Dependencies are inferred from the claim text.