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US 11,939,215 B2Granted
Microelectromechanical structure including a functional element situated in a cavity of the microelectromechanical structure
AssigneeRobert Bosch GmbH
InventorsPenny Weir, Markus Kuhnke, Stefan Majoni
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Abstract
A microelectromechanical structure, including a functional element situated in a cavity of the microelectromechanical structure. The functional element includes an aluminum nitride layer. The cavity is closed by a cap layer. The cap layer includes epitaxial silicon. A method for manufacturing a micromechanical structure is also described.
Claims9
A microelectromechanical structure, comprising:
- a functional element situated in a cavity of the microelectromechanical structure, the functional element including an aluminum nitride layer;
- wherein the cavity is closed by a cap layer, the cap layer including epitaxial silicon,
- wherein the aluminum nitride layer includes an insulating layer at an edge of the functional element,
- wherein the functional element includes a first silicon layer and a second silicon layer, the aluminum nitride layer being situated between the first silicon layer and the second silicon layer, and
- wherein the insulating layer separates the upper and lower silicon layers at the edge.
2 more elements
A method for manufacturing a micromechanical structure, comprising:
- providing a functional element in a cavity, the functional element including an aluminum nitride layer;
- after the providing, closing the cavity with a cap layer, the cap layer including epitaxial silicon;
- and
- providing an insulating layer at an edge of the functional element,
- wherein the functional element includes a first silicon layer and a second silicon layer, the aluminum nitride layer being situated between the first silicon layer and the second silicon layer, and
- wherein the insulating layer separates the upper and lower silicon layers at the edge.
3 more elements
Dependencies are inferred from the claim text.