Apparatus for processing substrate and operating method thereof
AssigneeSemes Co., Ltd.
InventorsNoh Hoon Myoung, Han Seon Kang, Jung Min Yoon
Life of this patent
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Abstract
Provided is a substrate processing apparatus. The substrate processing apparatus includes a swing nozzle that is arranged on one side of the support module, moves in a swing manner, and sprays a chemical solution to the substrate, a sensor arranged on one side of the swing nozzle to sense movement of the swing nozzle, an electromagnet and a magnet installed on the other side of the swing nozzle so as to be able to adjust spacing relative to each other, and a controller for receiving a sensing result of the sensor and performing a damping operation to the swing nozzle by providing power to the electromagnet to generate an attractive force or repulsive force between the electromagnet and the magnet.
Claims17
A substrate processing apparatus comprising:
- a support module that supports a substrate and is swingable;
- a swing nozzle that is arranged on one side of the support module, moves in a swing manner, and sprays a chemical solution to the substrate;
- a sensor arranged on one side of the swing nozzle to sense movement of the swing nozzle;
- an electromagnet and a magnet installed on the other side of the swing nozzle so as to be able to adjust spacing relative to each other;
- and
- a controller for receiving a sensing result of the sensor and performing a damping operation to the swing nozzle by providing power to the electromagnet to generate an attractive force or repulsive force between the electromagnet and the magnet.
A substrate processing apparatus comprising:
- a swing nozzle for spraying a chemical solution to a substrate;
- an acceleration sensor arranged on one side of the swing nozzle;
- and
- a damper that is arranged on the other side of the swing nozzle, and performs a damping operation according to an acceleration sensed by the acceleration sensor,
- wherein the damper comprises,
- an electromagnet connected to the other side of the swing nozzle through a first spring, and
- a magnet connected to the other side of the swing nozzle through a second spring and arranged to face the electromagnet.
A method for operating a substrate processing apparatus comprising:
- providing a substrate processing apparatus including a swing nozzle, an acceleration sensor arranged on one side of the swing nozzle to sense movement of the swing nozzle, an electromagnet connected to the other side of the swing nozzle through a first spring, and a magnet connected to the other side of the swing nozzle through a second spring and arranged to face the electromagnet,
- sensing a vibration of the swing nozzle through the acceleration sensor, and
- generating a repulsive force between the electromagnet and the magnet to increase a distance between the electromagnet and the magnet according to a sensing result of the acceleration sensor.
Dependencies are inferred from the claim text.