Hardmask composition and method of forming patterns

A hardmask composition, comprising:

• a polymer including a moiety derived from a compound represented by Chemical Formula 2;
• and
• a solvent,
• wherein, in Chemical Formula 2,
• X3 to X3 are each independently N or CRa, in which Ra is hydrogen, a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C2 to C30 alkenyl group, a substituted or unsubstituted C2 to C30 alkynyl group, a substituted or unsubstituted C6 to C30 aryl group, or a substituted or unsubstituted C2 to C40 heterocycle,
• B1 to B6 are each independently a C6 to C30 aromatic ring,
• L1 to L3 are each independently a single bond, a substituted or unsubstituted C6 to C30 arylene group, or a combination thereof,
• R1 to R3 are each independently a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C2 to C30 alkenyl group, a substituted or unsubstituted C2 to C30 alkynyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C2 to C30 heterocyclic group, or a combination thereof,
• m1 to m6 are each independently 0 or 1, and
• n1 to n3 are each independently an integer of 0 to 4.