Method of manufacturing template and method of forming pattern

A method of forming a pattern, comprising:

• forming a first mask layer on a surface of a substrate, the substrate containing quartz, and the first mask layer containing chromium;
• forming a second mask layer on a part of the first mask layer containing photoresist;
• processing the first mask layer using the second mask layer to form a pattern of the first mask layer;
• processing the substrate using the first mask layer with the pattern to form a protrusion and a depression on the surface;
• and
• processing the depression,
• the processing of the depression, including:
• a first step of forming a film on the surface of the substrate from which the first and second mask layers are removed, the film including a first region and a second region, the first region being provided on the protrusion, and the second region being provided on a bottom of the depression and being thinner than the first region;
• a second step of removing the second region with the first region partly remaining to expose the bottom of the depression;
• and
• a third step of processing the exposed part of the depression using a mask made of the remainder of the first region.

A method of manufacturing a template, comprising:

• preparing a substrate containing quartz and having a surface, the surface including a protrusion and a depression;
• and
• processing the depression,
• the processing of the depression, including:
• a first step of forming a film on the surface, the film including a first region and a second region, the first region being provided on the protrusion, and the second region being provided on a bottom of the depression and being thinner than the first region;
• a second step of removing the second region with the first region partly remaining to expose the bottom of the depression;
• and
• a third step of processing the exposed part of the depression using a mask made of the remainder of the first region,
• wherein the surface further includes a second depression,
• a width of the depression is larger than a width of the second depression,
• the film further includes a fourth region, the fourth region filling the second depression and being thicker than the second region, and
• the second region is removed with each of the first and fourth regions partly remaining.