Sample support, method for producing sample support, ionization method and mass spectrometry method
AssigneeHamamatsu Photonics K.K.
InventorsMasahiro Kotani, Takayuki Ohmura, Akira Tashiro
Life of this patent
Estimating the term…
Abstract
A sample support body for ionization of a sample, including: a substrate having a first surface, a second surface on a side opposite to the first surface, and a plurality of through-holes opening on each of the first surface and the second surface; a conductive layer provided on the first surface; and a matrix crystal layer provided on at least one of the conductive layer and the second surface, in which the matrix crystal layer is formed of a plurality of matrix crystal grains so as to include a gap communicating the plurality of through-holes with an outside.
Claims10
A sample support body for ionization of a sample, comprising:
- a substrate having a first surface, a second surface on a side opposite to the first surface, and a plurality of through-holes opening on each of the first surface and the second surface;
- a conductive layer provided on the first surface;
- and
- a matrix crystal layer provided on at least one of the conductive layer and the second surface,
- wherein the matrix crystal layer is formed of a plurality of matrix crystal grains so as to include a gap communicating the plurality of through-holes with an outside.
A sample support body for ionization of a sample, comprising:
- a conductive substrate having a first surface, a second surface on a side opposite to the first surface, and a plurality of through-holes opening on each of the first surface and the second surface;
- and
- a matrix crystal layer provided on at least one of the first surface and the second surface,
- wherein the matrix crystal layer is formed with a plurality of matrix crystal grains so as to include a gap communicating the plurality of through-holes with an outside.
A method for manufacturing a sample support body for ionization of a sample, comprising:
- a process of preparing a substrate having a first surface, a second surface on a side opposite to the first surface, and a plurality of through-holes opening on each of the first surface and the second surface and being provided with a conductive layer on the first surface;
- and
- a process of providing a matrix crystal layer on at least one of the conductive layer and the second surface by evaporation of a matrix material,
- wherein, in the process of providing the matrix crystal layer, the matrix crystal layer is formed with a plurality of matrix crystal grains so as to include a gap communicating the plurality of through-holes with an outside.
A method for manufacturing a sample support body for ionization of a sample, comprising:
- a process of preparing a conductive substrate having a first surface, a second surface on a side opposite to the first surface, and a plurality of through-holes opening on each of the first surface and the second surface;
- and
- a process of providing a matrix crystal layer on at least one of the first surface and the second surface by evaporation of a matrix material,
- wherein, in the process of providing the matrix crystal layer, the matrix crystal layer is formed with a plurality of matrix crystal grains so as to include a gap communicating the plurality of through-holes with an outside.
An ionization method, comprising:
- a process of preparing a substrate having a first surface, a second surface on a side opposite to the first surface, and a plurality of through-holes opening on each of the first surface and the second surface and being provided with a conductive layer on the first surface;
- a process of arranging a sample on a mount portion and arranging the substrate on the sample so that the second surface is in contact with the sample;
- a process of providing a matrix crystal layer on the conductive layer by evaporation of a matrix material;
- and
- a process of ionizing components of the sample having moved from the second surface side to the first surface side via the plurality of through-holes together with the matrix by irradiating the first surface with an energy beam while applying a voltage to the conductive layer in a state where the sample is arranged between the mount portion and the substrate,
- wherein, in the process of providing the matrix crystal layer, the matrix crystal layer is formed with a plurality of matrix crystal grains so as to include a gap communicating the plurality of through-holes with an outside.
An ionization method, comprising:
- a process of preparing a conductive substrate having a first surface, a second surface on a side opposite to the first surface, and a plurality of through-holes opening on each of the first surface and the second surface;
- a process of arranging a sample on a mount portion and arranging the substrate on the sample so that the second surface is in contact with the sample;
- a process of providing a matrix crystal layer on the first surface by evaporation of a matrix material;
- and
- a process of ionizing components of the sample having moved from the second surface side to the first surface side via the plurality of through-holes together with the matrix by irradiating the first surface with an energy beam while applying a voltage to the substrate in a state where the sample is arranged between the mount portion and the substrate,
- wherein, in the process of providing the matrix crystal layer, the matrix crystal layer is formed with a plurality of matrix crystal grains so as to include a gap communicating the plurality of through-holes with an outside.
Dependencies are inferred from the claim text.