Heat treatment apparatus and heat treatment method
AssigneeTokyo Electron Limited
InventorsTatsuya Yamaguchi, Toshiyuki Ito
Life of this patent
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Abstract
A heat treatment apparatus according to one aspect of the present disclosure includes a vertically long process chamber, a heater configured to heat the process chamber, and a cooler configured to cool the process chamber. The cooler includes a plurality of discharge holes provided at intervals along a longitudinal direction of the process chamber to discharge cooling fluid toward the process chamber and a plurality of shutters provided corresponding to the plurality of discharge holes. At least one of the plurality of shutters is configured to move to an open position independently of other shutters.
Claims12
A heat treatment apparatus comprising:
- a vertically long process chamber;
- a heater configured to heat the process chamber;
- and
- a cooler configured to cool the process chamber,
- wherein the cooler includes:
- a plurality of discharge holes provided at intervals along a longitudinal direction of the process chamber to discharge cooling fluid toward the process chamber;
- and
- a plurality of shutters provided corresponding to the plurality of discharge holes,
- wherein at least one of the plurality of shutters is configured to move to an open position independently of other shutters, and
- wherein at least a shutter at a top portion among the plurality of shutters is configured to move to the open position independently of other shutters.
A heat treatment apparatus comprising:
- a vertically long process chamber;
- a heater configured to heat the process chamber;
- and
- a cooler configured to cool the process chamber,
- wherein the cooler includes:
- a plurality of discharge holes provided at intervals along a longitudinal direction of the process chamber to discharge cooling fluid toward the process chamber;
- and
- a plurality of shutters provided corresponding to the plurality of discharge holes,
- wherein at least one of the plurality of shutters is configured to move to an open position independently of other shutters, and
- wherein each of the plurality of shutters is configured to move to the open position independently of other shutters.
A heat treatment method of a heat treatment apparatus including:
- a heater configured to heat a vertically long process chamber;
- and a cooler configured to cool the process chamber, the cooler including a plurality of discharge holes provided at intervals along a longitudinal direction of the process chamber to discharge cooling fluid toward the process chamber;
- and a plurality of shutters provided corresponding to the plurality of discharge holes, the heat treatment method comprising:
- performing a heat treatment in the process chamber in a state where at least one of the plurality of shutters is moved to an open position and a remainder of the plurality of shutters is moved to a closed position,
- wherein the performing of the heat treatment includes moving at least a shutter at a top portion among the plurality of shutters to the open position independently of other shutters.
A heat treatment method of a heat treatment apparatus including:
- a heater configured to heat a vertically long process chamber;
- and a cooler configured to cool the process chamber, the cooler including a plurality of discharge holes provided at intervals along a longitudinal direction of the process chamber to discharge cooling fluid toward the process chamber;
- and a plurality of shutters provided corresponding to the plurality of discharge holes, the heat treatment method comprising:
- performing a heat treatment in the process chamber in a state where at least one of the plurality of shutters is moved to an open position and a remainder of the plurality of shutters is moved to a closed position,
- wherein the performing of the heat treatment includes moving each of the plurality of shutters to the open position independently of other shutters.
Dependencies are inferred from the claim text.