Conductive structure, manufacturing method therefor, and electrode comprising conductive structure

A conductive structure body, comprising:

• a substrate;
• a metal layer provided on the substrate;
• and
• a light reflection reducing layer provided on at least one surface of the metal layer,
• wherein the light reflection reducing layer consists of MoTiaOxNy (0<a≤2, 0<x≤3, 0<y≤2, x+y>0, and a, x and y mean ratios of the number of atoms of Ti, O and N, respectively), and
• wherein the light reflection reducing layer has an element content of O and N that satisfy 0<Nat %/Oat %≤0.02,
• wherein the element content of O of the light reflection reducing layer is 42,5 at % or more and less than 53.9 at %,
• wherein the element content of Mo of the light reflection reducing layer is 28.6 at % or more and 33.2 at %,
• wherein the element content of Ti of the light reflection reducing layer is 12.7 at % or more and 14.5 at % or less, and
• wherein the element content of N of the light reflection reducing layer is 1.3 at % or more and 4.6 at % or less.