Back to results
US 11,924,979 B2Granted
Resin composition, laminate, semiconductor wafer with resin composition layer, substrate for mounting semiconductor with resin composition layer and semiconductor device
AssigneeMitsubishi Gas Chemical Company, Inc.
InventorsMasashi Okaniwa, Takenori Takiguchi, Kohei Higashiguchi, Tsuyoshi Kida
Life of this patent
Estimating the term…
Abstract
A resin composition that has both excellent flux activity and high insulation reliability, that possesses good storage stability, and that further has flexibility with good operability upon being used as a laminate is provided. The resin composition contains a chelating flux agent (A), a thermal radical polymerization initiator (B) and a radical polymerizable compound (C).
Claims26
A resin composition comprising:
- a chelating flux agent (A);
- a thermal radical polymerization initiator (B);
- and
- a radical polymerizable compound (C);
- wherein a content of the chelating flux agent (A) in the resin composition is 10 parts by mass or more and 50 parts by mass or less based on 100 parts by mass of a total amount of the radical polymerizable compound (C);
- wherein the chelating flux agent (A) comprises a compound represented by the following formula (1):
- wherein
- Q is an arylene group, an alkylene group, an alkenylene group, a cycloalkylene group, a cycloalkenylene group, a heterocyclylene group or a heteroarylene group,
- R1 and R2 are each independently a hydrogen atom, a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group or a hexyl group,
- R3 and R4 are each a 2-hydroxyphenyl group, and
- for the arylene group, the alkylene group, the alkenylene group, the cycloalkylene group, the cycloalkenylene group, the heterocyclylene group, and the heteroarylene group, a hydrogen atom bonded to the group is optionally substituted with a hydroxy group or a mercapto group,
- and/or an imine compound represented by the following formula (2):
- wherein
- R5 is a hydrogen atom, a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group or a hexyl group,
- R6 and R7 are each independently an alkyl group, a cycloalkyl group, an aryl group, a heteroaryl group or a heterocyclyl group, and
- for the alkyl group, the cycloalkyl group, the aryl group, the heteroaryl group and the heterocyclyl group, a hydrogen atom bonded to the group is optionally substituted with a hydroxy group or a mercapto group;
- and
- wherein the radical polymerizable compound (C) comprises:
- a maleimide compound represented by the following formula (4):
- wherein
- an average value of n2 is 1 or more and 30 or less,
- and at least one maleimide compound selected from the group consisting of:
- 2,2-bis(4-(4-maleimidophenoxy)phenyl)propane,
- a maleimide compound represented by the following formula (3):
- wherein
- each R8 independently represents a hydrogen atom or a methyl group, and
- n1 represents an integer of 1 or more, and
- a maleimide compound represented by the following formula (5):
- wherein
- R9 and R10 each independently represent a hydrogen atom, a methyl group or an ethyl group, and
- each R11 independently represents a hydrogen atom or a methyl group.
28 more elements
Dependencies are inferred from the claim text.