Methods and systems for inclusion analysis
AssigneeFEI Company
InventorsJean-Marc Bohlen, Cornelis van Beek
Life of this patent
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Abstract
Various methods and systems are provided for analyzing sample inclusions. As one example, a correction factor may be generated based on inclusion properties of a first sample determined using both an optical emission spectrometry (OES) system and a charged-particle microscopy with energy dispersive X-ray spectroscopy (CPM/EDX) system. The OES system may be calibrated with the correction factor. The inclusion properties of a second, different, sample may be determined using the calibrated OES system.
Claims16
A method for analyzing sample inclusions, comprising;
- calibrating an optical emission spectrometry (OES) system using a calibration factor, wherein the calibration factor is generated based on inclusion properties of a first sample determined using both the OES system and a charged-particle microscopy with energy dispersive X-ray spectroscopy (CPM/EDX) system;
- and
- determining, with the calibrated OES system, an inclusion property of a second, different sample.
A charged-particle microscope, comprising:
- a detector for acquiring energy dispersive X-ray spectroscopy (EDX) data, and
- a controller with computer readable instructions stored on a non-transitory memory, by executing the computer readable instructions, the charged-particle microscope is configured to:
- receive inclusion properties of a first sample determined using an OES system;
- acquire EDX data of the first sample via the detector;
- determine inclusion properties of the first sample based on the EDX data;
- generate a correction factor based on both the received inclusion properties from the OES system and the determined inclusion properties based on the EDX data;
- and
- output the correction factor to the OES system for calibrating the OES system.
An OES system, comprising:
- a controller with computer readable instructions stored on a non-transitory memory, wherein by executing the computer readable instructions, the OES system is configured to:
- determine inclusion properties of a first sample;
- receive inclusion properties of the first sample determined using a CPM/EDX system;
- generate a correction factor based on both of the measured inclusion properties and the received inclusion properties of the first sample;
- calibrate the OES system based on the correction factor;
- and
- determine inclusion properties of a second sample with the calibrated OES system.
Dependencies are inferred from the claim text.