Carbon-doped silicon dioxide glass and methods of manufacturing thereof
AssigneeCorning Incorporated
InventorsYunfeng Gu, Nicolas LeBlond, Ming-Jun Li, Jeffery Scott Stone, Haitao Zhang
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Abstract
A silica-based substrate includes a glass phase and a dispersed phase having carbon, such that the silica-based substrate has a thickness of at least 10 gm. Also disclosed is a method of forming a silica-based substrate, the method including contacting a porous silica soot preform with an organic solution having at least one hydrocarbon precursor to form a doped silica soot preform and heating the doped silica soot preform in an inert atmosphere to form the silica-based substrate.
Claims20
A silica-based substrate comprising:
- a glass phase;
- a dispersed phase comprising carbon,
- wherein the silica-based substrate has a thickness of at least 10 μm, and the carbon is a nanostructure comprising at least one of nanoparticles, nanorods, nanowires, nanocylinders, or nanoribbons.
A method of forming a silica-based substrate, the method comprising:
- contacting a porous silica soot preform with an organic solution comprising at least one hydrocarbon precursor to form a doped silica soot preform;
- heating the doped silica soot preform in an inert atmosphere to form the silica-based substrate,
- wherein the hydrocarbon precursor comprises at least one of:
- (a) alkanes of the form CnH2n+2;
- (b) alkenes of the form CnH2n;
- (c) carboxylic acids, amines, or alcohols with an aliphatic group of at least 6 carbon atoms;
- (d) metal carboxylates;
- (e) graphite powder;
- amorphous carbon powder;
- paraffin wax;
- or phenolic resin;
- or
- (f) organic polymers;
- wherein n>6.
A method of forming a silica-based substrate, the method comprising:
- contacting a porous silica soot preform with an organic solution comprising at least one hydrocarbon precursor to form a doped silica soot preform;
- heating the doped silica soot preform in an inert atmosphere to form the silica-based substrate,
- wherein the heating is conducted at a temperature in a range of 1000° C. to 2000° C. and for a time in a range of 0.1 hr to 10 hrs.
Dependencies are inferred from the claim text.