Lithographic apparatus

A measurement system for an apparatus comprising a movable table configured to support a substrate, and a projection system configured to project a radiation beam onto the substrate, the projection system being at a first side of the substrate when supported by the table, the measurement system comprising:

• an encoder system configured to provide a signal representative of a position of the table;
• a measurement system configured to measure a mark arranged to be located at a second side of the substrate opposite from the first side;
• and
• at least a detector part of the encoder system and at least a detector part of the measurement system both configured to be located at the second side.

A measurement system for an apparatus comprising a movable table and a projection system configured to project a radiation beam onto the movable table, the projection system being at a first side of the table, the measurement system comprising:

• an encoder system configured to provide a signal representative of a position of the table;
• an alignment measurement device configured to measure a mark movable with the movable table;
• and
• at least a detector part of the encoder system and at least a detector part of the alignment measurement device both configured to be located at a second side of the table opposite from the first side.