# US 11,910,726 B2 · Multi-stack susceptor reactor for high-throughput superconductor manufacturing > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 11,910,726 B2 - Document ID: US11910726B2 - Status: Granted - Kind: B2 - Application number: 18/016,338 - Filed: 2022-02-25 - Published: 2023-07-06 - Granted: 2024-02-20 - Earliest claimed: 2021-02-26 - Assignees: MetOx International, Inc. - Applicants: MetOx Technologies, Inc. - Inventors: Shahab Khandan; Nagaraja Shashidhar; Mikhail Novozhilov - Web page: https://patentgrep.com/patent/US11910726B2 ## CPC - H10N 60/0464: {by metalloorganic chemical vapour deposition [MOCVD]} - C23C 16/40: Oxides - C23C 16/45565: {Shower nozzles} - C23C 16/458: characterised by the method used for supporting substrates in the reaction chamber - C23C 16/4586: {Elements in the interior of the support, e.g. electrodes, heating or cooling devices} - C23C 16/46: characterised by the method used for heating the substrate (C23C16/48, C23C16/50 take precedence) - C23C 16/52: Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)} - C23C 16/545: {for coating elongated substrates} - H10N: ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) ## Abstract A vapor deposition reactor apparatus, systems and methods for deposition of thin films, particularly high-temperature superconducting (HTS) coated conductors, utilize multi-sided susceptors and susceptor pairs for increased production throughput. The reactors may also be configured in multi-stack arrangements of the susceptors within a single reactor chamber for additional throughput gains. ## Claims ### Claim 1 A vapor deposition apparatus for manufacturing superconductors on an elongated substrate tape, the apparatus comprising: a deposition chamber maintained under vacuum and housing a precursor inlet showerhead, an outlet port, and a substrate susceptor, and wherein the susceptor comprises a heater element configured to heat both upper and lower surfaces of the susceptor; and an elongated substrate tape continuously spooled between a payout reel and a take-up reel, and wherein said elongated substrate tape slidably contacts both the upper and lower surfaces of the susceptor. ### Claim 2 (depends on 1) The apparatus of claim 1, wherein the susceptor further comprises more than one raised section each with a width substantially the width of an elongated substrate tape and each raised section extends vertically from the upper surface of a main body of the susceptor and lengthwise along the length of the main body of the susceptor such that two adjacent raised sections form a channel. ### Claim 3 (depends on 1) The apparatus of claim 1, wherein the elongated substrate tape winds around and contacts each side of the susceptor more than once. ### Claim 4 (depends on 1) The apparatus of claim 1, wherein the elongated substrate tape is comprised of more than one parallel tape translating together. ### Claim 5 (depends on 4) The apparatus of claim 4, wherein each elongated substrate tape winds around the susceptor more than once. ### Claim 6 (depends on 1) The apparatus of claim 1, wherein the reactor chamber comprises at least two susceptors arranged in pairs such that the elongated substrate tape slidably contacts both the upper and lower surfaces of each pair of susceptors within the reactor chamber. ### Claim 7 A vapor deposition apparatus for manufacturing superconductors on an elongated substrate tape, the apparatus comprising: a deposition chamber maintained under vacuum and housing a precursor inlet showerhead, an outlet port, and a two-piece substrate susceptor comprising an upper first substrate susceptor half and a lower second substrate susceptor half, and wherein each susceptor half comprises a heater element; and an elongated substrate tape continuously spooled between a payout reel and a take-up reel, wherein said elongated substrate tape slidably contacts both the upper surface of the first susceptor half and the lower surface of the second susceptor half. ### Claim 8 (depends on 7) The apparatus of claim 7, wherein the substrate susceptor halves are coupled together. ### Claim 9 (depends on 7) The apparatus of claim 7, wherein the substrate susceptor halves are separated by a vertical distance (d). ### Claim 10 (depends on 7) The apparatus of claim 7, wherein the two-piece substrate susceptor further comprises a dividing plate located between the susceptor halves. ### Claim 11 (depends on 7) The apparatus of claim 7, wherein each susceptor half further comprises more than one raised section each with a width substantially the width of an elongated substrate tape and each raised section extends vertically from the upper surface of a main body of the susceptor and lengthwise along the length of the main body of the susceptor such that two adjacent raised sections form a channel. ### Claim 12 (depends on 7) The apparatus of claim 7, wherein the elongated substrate tape winds around the two-piece substrate susceptor more than once. ### Claim 13 (depends on 7) The apparatus of claim 7, wherein the elongated substrate tape is comprised of more than one parallel tape translating together. ### Claim 14 (depends on 13) The apparatus of claim 13, wherein each elongated substrate tape winds around the two-piece substrate susceptor more than once. ### Claim 15 (depends on 7) The apparatus of claim 7, wherein the reactor chamber comprises more than one two-piece substrate susceptors and the elongated substrate tape slidably contacts both the upper surface of the first susceptor half and the lower surface of the second susceptor half of each two-piece substrate susceptor within the reactor chamber. ### Claim 16 A vapor deposition system for manufacturing superconductors on an elongated substrate tape, the system comprising: a vapor deposition apparatus including a deposition chamber maintained under vacuum and housing a precursor inlet showerhead, an outlet port, and a substrate susceptor with more than one susceptor surface, more than one heater element connected to the substrate susceptor, and an elongated substrate tape continuously spooled between a payout reel and a take-up reel, and wherein said substrate tape slidably contacts more than one susceptor surface of the substrate susceptor, a measuring unit configured to measure a parameter (P) of the vapor deposition apparatus, a master controller (MC) configured to receive the measured parameter (P) from the measuring unit; and a second controller (SC) configured to receive a command from the master controller (MC) and adjust a second parameter (P2) associated with the susceptor based on the measured parameter (P). ### Claim 17 (depends on 16) The system of claim 16, wherein the measured parameter (P) is susceptor temperature and the second parameter (P2) is heat input to at least one heater element. ### Claim 18 (depends on 16) The system of claim 16, wherein the measured parameter (P) is substrate temperature and the second parameter (P2) is heat input to at least one heater element. ### Claim 19 (depends on 16) The system of claim 16, wherein the susceptor further comprises more than one raised section each with a width substantially the width of an elongated substrate tape and each raised section extends vertically from the upper surface of a main body of the susceptor and lengthwise along the length of the main body of the susceptor such that two adjacent raised sections form a channel. ### Claim 20 (depends on 16) The system of claim 16, wherein the elongated substrate tape is comprised of more than one parallel tape translating together.