# US 11,909,335 B2 · Electrostatic chuck and substrate fixing device

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- Number: US 11,909,335 B2
- Document ID: US11909335B2
- Status: Granted
- Kind: B2
- Application number: 17/550,502
- Filed: 2021-12-14
- Published: 2022-06-16
- Granted: 2024-02-20
- Earliest claimed: 2020-12-16
- Assignees: Shinko Electric Industries Co., Ltd.
- Applicants: Shinko Electric Industries Co., Ltd.
- Inventors: Takashi Onuma; Keiichi Takemoto
- Web page: https://patentgrep.com/patent/US11909335B2

## CPC

- H02N 13/00: Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
- H10P 72/0434: {mainly by convection}
- H10P 72/72: using electrostatic chucks
- H10P 72/722: {Details of electrostatic chucks}
- H10P 72/7616: {characterised by a coating, a hardness or a material}
- H01J 37/32715: {Workpiece holder}
- H01J 2237/2007: Holding mechanisms
- H01J 2237/334: Etching
- H02N: ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)

## Abstract

An electrostatic chuck includes a base body having a placement surface on which a suction target object is placed, and an electrode embedded in the base body. The base body is provided with a groove that opens to the placement surface-side and does not reach the electrode. Aloes-resistance region made of ceramics and a high-resistance region made of ceramics having a volume resistivity higher than the low-resistance region are sequentially arranged from a side close to the groove between a bottom surface of the groove and the electrode, in a thickness direction of the base body.

## Claims

### Claim 1

An electrostatic chuck comprising:
a base body having a placement surface on which a suction target object is placed;
an electrode embedded in the base body; and
a gas discharge portion,
wherein the base body is provided with a groove that opens to the placement surface-side and does not reach the electrode,
wherein a low-resistance region made of ceramics and a high-resistance region made of ceramics having a volume resistivity higher than the low-resistance region are sequentially arranged from a side close to the groove between a bottom surface of the groove and the electrode, in a thickness direction of the base body, and
wherein the gas discharge portion opens to the bottom surface of the groove, and the gas discharge portion is formed to penetrate the high-resistance region.

### Claim 2 (depends on 1)

The electrostatic chuck according to claim 1, wherein the high-resistance region is provided in a region overlapping the groove, as seen from above.

### Claim 3 (depends on 2)

The electrostatic chuck according to claim 2, wherein the groove is provided in an annular shape, as seen from above, and
wherein the high-resistance region is provided in an annular shape in the region overlapping the groove.

### Claim 4 (depends on 3)

The electrostatic chuck according to claim 3, wherein a plurality of grooves is provided in a concentric manner so as not to be in contact with each other, as seen from above,
a plurality of gas discharge portions are provided to open to the bottom surface of each of the plurality of grooves, and
wherein the high-resistance region is provided in an annular shape in a region overlapping each of the grooves, as seen from above.

### Claim 5 (depends on 1)

The electrostatic chuck according to claim 1, wherein the high-resistance region has a width greater than the groove.

### Claim 6 (depends on 1)

The electrostatic chuck according to claim 1, wherein the high-resistance region is in contact with a surface of the electrode facing toward the groove.

### Claim 7 (depends on 1)

The electrostatic chuck according to claim 1, wherein the high-resistance region is formed of aluminum oxide and has a volume resistivity of 1015 Ωm or higher.

### Claim 8 (depends on 1)

The electrostatic chuck according to claim 1, wherein the electrostatic chuck is a Johnsen-Rahbeck type.

### Claim 9 (depends on 1)

A substrate fixing device comprising:
a base plate; and
the electrostatic chuck according to claim 1 mounted on a surface of the base plate.