# US 11,908,726 B2 · Method of manufacturing electrostatic chuck having electrode layer made of heterogeneous composite material, and electrostatic chuck manufactured thereby

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 11,908,726 B2
- Document ID: US11908726B2
- Status: Granted
- Kind: B2
- Application number: 17/732,968
- Filed: 2022-04-29
- Published: 2022-11-10
- Granted: 2024-02-20
- Earliest claimed: 2021-05-10
- Assignees: Pukyong National University Industry-University Cooperation Foundation
- Applicants: Pukyong National University Industry-University Cooperation Foundation
- Inventors: Hansang Kwon
- Web page: https://patentgrep.com/patent/US11908726B2

## CPC

- H10P 72/722: {Details of electrostatic chucks}
- B22F 3/105: by using electric current {other than for infrared radiant energy}, laser radiation or plasma (B22F3/11 takes precedence){; by ultrasonic bonding (B22F3/115 takes precedence)}
- B22F 3/24: After-treatment of workpieces or articles {(B22F3/1146 takes precedence)}
- B22F 9/04: starting from solid material, e.g. by crushing, grinding or milling ({C22C1/1084 takes precedence}; crushing, grinding or milling, in general, see the relevant subclasses, e.g. B02C)
- B23Q 3/15: Devices for holding work using magnetic or electric force acting directly on the work
- C01F 7/021: After-treatment of oxides or hydroxides
- C22C 21/00: Alloys based on aluminium
- C22C 38/105: {containing Co and Ni}
- C22F 3/00: Changing the physical structure of non-ferrous metals or alloys by special physical methods, e.g. treatment with neutrons
- C23C 4/11: Oxides
- C23C 4/134: Plasma spraying
- C23C 28/30: {Coatings combining at least one metallic layer and at least one inorganic non-metallic layer}
- B22F 2003/1051: {by electric discharge}
- B22F 2003/242: {Coating}
- B22F 2005/002: {Tools other than cutting tools}
- B22F 2009/043: {by ball milling}
- B22F 2301/052: Aluminium
- B22F 2302/40: Carbon, graphite
- B22F 2998/10: Processes characterised by the sequence of their steps
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- B22F: WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER (making alloys by powder metallurgy C22C); APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B23Q: DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING (tools of the kind used in lathes or boring machines B23B27/00); MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- C01F: COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS (metal hydrides {monoborane, diborane or addition complexes thereof} C01B6/00; salts of oxyacids of halogens C01B11/00; peroxides, salts of peroxyacids C01B15/00; sulfides or polysulfides of magnesium, calcium, strontium, or barium C01B17/42; thiosulfates, dithionites, polythionates C01B17/64; compounds containing selenium or tellurium C01B19/00; binary compounds of nitrogen with metals C01B21/06; azides C01B21/08; {compounds other than ammonia or cyanogen containing nitrogen and non-metals and optionally metals C01B21/082; amides or imides of silicon C01B21/087}; metal {imides or} amides C01B21/092, {C01B21/0923}; nitrites C01B21/50; {compounds of noble gases C01B23/0005}; phosphides C01B25/08; salts of oxyacids of phosphorus C01B25/16; carbides C01B32/90; compounds containing silicon C01B33/00; compounds containing boron C01B35/00; compounds having molecular sieve properties but not having base-exchange properties C01B37/00; compounds having molecular sieve and base-exchange properties, e.g. crystalline zeolites, C01B39/00; cyanides C01C3/08; salts of cyanic acid C01C3/14; salts of cyanamide C01C3/16; thiocyanates C01C3/20; {double sulfates of magnesium with sodium or potassium C01D5/12; with other alkali metals C01D15/00, C01D17/00})
- C22C: ALLOYS (treatment of alloys C21D, C22F)
- C22F: CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS (surface treatment of metallic material involving at least one process provided for in class C23 and at least one process covered by this subclass, C23F17/00)
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)

## Abstract

This application relates to a method of manufacturing an electrostatic chuck having good characteristics in heat dissipation, thermal shock resistance, and lightness. In one aspect, the method includes preparing a composite powder by ball-milling (i) aluminum or aluminum alloy powder and (ii) carbon-based nanomaterial powder. The method may also include preparing an electrode layer by sintering the composite powder through spark plasma sintering (SPS), and forming a dielectric layer on the electrode layer.

## Claims

### Claim 1

A method of manufacturing an electrostatic chuck, the method comprising:
preparing a powdered composite material by ball-milling (i) aluminum or aluminum alloy powder and (ii) carbon-based nanomaterial powder;
preparing an electrode layer by subjecting the powdered composite material to spark plasma sintering (SPS);
forming a metal layer at least partially over the electrode layer, the metal layer comprising 1% to 5% by weight of cobalt (Co), 10% to 20% by weight of nickel (Ni), and 75% to 85% by weight of iron (Fe); and
forming a dielectric layer at least partially over the electrode layer and the metal layer.

### Claim 2 (depends on 1)

The method according to claim 1, wherein the carbon-based nanomaterial powder is at least one selected from the group consisting of carbon nanotubes, graphene, carbon nanofibers, carbon nanoparticles, mesoporous carbon, carbon nanosheets, carbon nanorods, and carbon nanobelts.

### Claim 3 (depends on 1)

The method according to claim 1, wherein, in preparing the electrode layer, the powdered composite material undergoes spark plasma sintering under a pressure of 30 MPa to 100 MPa at a temperature of 350° C. to 650° C. for 1 second to 30 minutes to prepare the electrode layer.

### Claim 4 (depends on 1)

The method according to claim 1, wherein, in forming the dielectric layer, the dielectric layer is made of Al2O3, ZrO3, AlN, or Y2O3 and formed by thermal spraying.

### Claim 5 (depends on 4)

The method according to claim 4, wherein the thermal spraying is air plasma spraying (APS), vacuum plasma spraying (VPS), or low pressure plasma spraying (LPPS).

### Claim 6 (depends on 1)

The method according to claim 1, wherein a thermal conductivity of the electrode layer is greater than that of a pure aluminum and smaller than 260 W/m-K.

### Claim 7 (depends on 1)

The method according to claim 1, wherein a tensile strength of the electrode layer is greater than that of a pure aluminum.

### Claim 8 (depends on 7)

The method according to claim 7, wherein the tensile strength of the electrode layer is at least 300% greater than that of the pure aluminum.

### Claim 9 (depends on 1)

The method according to claim 1, wherein a coefficient of thermal expansion of the electrode layer is smaller than that of a pure aluminum.

### Claim 10 (depends on 9)

The method according to claim 9, wherein the coefficient of thermal expansion of the electrode layer is 17×10−6 K−1.
