# US 11,908,725 B2 · Electrostatic chuck heater and manufacturing method therefor > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 11,908,725 B2 - Document ID: US11908725B2 - Status: Granted - Kind: B2 - Application number: 17/633,177 - Filed: 2020-06-23 - Published: 2022-09-22 - Granted: 2024-02-20 - Earliest claimed: 2019-08-06 - Assignees: MiCo Ceramics Ltd. - Applicants: Mico Ceramics Ltd. - Inventors: Jin Young Choi; Jun Won Seo; Ju Sung Lee - Web page: https://patentgrep.com/patent/US11908725B2 ## CPC - H10P 72/0432: {mainly by conduction} - H10P 72/722: {Details of electrostatic chucks} - B23Q 3/15: Devices for holding work using magnetic or electric force acting directly on the work - B28B 3/025: {Hot pressing, e.g. of ceramic materials} - B28B 11/243: {Setting, e.g. drying, dehydrating or firing ceramic articles (B28B11/242 takes precedence)} - B28B 13/022: {Feeding several successive layers, optionally of different materials} - B28B 13/0295: {Treating the surface of the fed layer, e.g. removing material or equalization of the surface} - B28B 23/0056: {Means for inserting the elements into the mould or supporting them in the mould (B28B23/022 takes precedence)} - C23C 14/50: Substrate holders - C23C 16/4586: {Elements in the interior of the support, e.g. electrodes, heating or cooling devices} - H02N 13/00: Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect - H05B 3/283: {the insulating material being an inorganic material, e.g. ceramic} - H05B 6/62: Apparatus for specific applications - H05B 2203/014: Heaters using resistive wires or cables not provided for in H05B3/54 - H05B 2203/017: Manufacturing methods or apparatus for heaters - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 - B23Q: DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING (tools of the kind used in lathes or boring machines B23B27/00); MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT - B28B: SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS; SHAPING SLAG; SHAPING MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER (foundry moulding B22C; working stone or stone-like material B28D; shaping of substances in a plastic state, in general B29C; making layered products not composed wholly of these substances B32B) - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - H02N: ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR - H05B: ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL ## Abstract The present invention relates to an electrostatic chuck heater having a bipolar structure, the electrostatic chuck heater comprising: a heater body having an internal electrode and an external electrode for selectively performing any one of an RF grounding function and an electrostatic chuck function according to a semiconductor process mode; and a heater support mounted below the heater body so as to support the heater body. ## Claims ### Claim 1 An electrostatic chuck heater comprising: a heater body including an internal electrode and an external electrode configured to selectively perform any one of a radio-frequency (RF) grounding function and an electrostatic chuck function according to a semiconductor process mode; and a heater support mounted below the heater body to support the heater body, wherein the heater body further includes an external electrode connecting member disposed between an electrode layer and a heating element layer to electrically connect the external electrode and a rod installed in the heater support to each other, and wherein the external electrode connecting member is spaced apart from lower surfaces of the internal electrode and the external electrode by a predetermined distance and disposed in parallel to the electrodes, and both ends of the external electrode connecting member are bent toward the lower surface of the external electrode. ### Claim 2 (depends on 1) The electrostatic chuck heater of claim 1, wherein the external electrode is formed on a same plane as the internal electrode. ### Claim 3 (depends on 1) The electrostatic chuck heater of claim 1, wherein the external electrode is disposed to be spaced apart from the internal electrode by a predetermined distance. ### Claim 4 (depends on 1) The electrostatic chuck heater of claim 1, wherein the external electrode is disposed to surround the internal electrode. ### Claim 5 (depends on 1) The electrostatic chuck heater of claim 1, wherein the internal electrode is embedded in an upper central portion of the heater body. ### Claim 6 (depends on 1) The electrostatic chuck heater of claim 1, wherein the internal electrode, the external electrode, and the external electrode connecting member are formed in any one of a sheet type, a mesh type, and a paste type. ### Claim 7 (depends on 1) The electrostatic chuck heater of claim 1, wherein the internal electrode, the external electrode, and the external electrode connecting member are made of molybdenum (Mo) having excellent electrical conductivity. ### Claim 8 (depends on 1) The electrostatic chuck heater of claim 1, further comprising: a bipolar function selector electrically connected to the internal electrode and the external electrode embedded in the heater body to select functions of the internal electrode and the external electrode. ### Claim 9 (depends on 8) The electrostatic chuck heater of claim 8, wherein the bipolar function selector includes an internal electrode function selector configured to select a function of the internal electrode and an external electrode function selector configured to select a function of the external electrode. ### Claim 10 (depends on 9) The electrostatic chuck heater of claim 9, wherein the internal electrode function selector includes a first capacitor C1, a first switch S1, and a first DC power supply configured to supply a positive DC voltage V1, and the external electrode function selector includes a second capacitor C2, a second switch S2, and a second DC power supply configured to supply a negative DC voltage V2. ### Claim 11 (depends on 8) The electrostatic chuck heater of claim 8, wherein the bipolar function selector is configured to select the functions of the electrodes such that at least one of the internal electrode and the external electrode performs the RF grounding function in a first semiconductor process mode. ### Claim 12 (depends on 8) The electrostatic chuck heater of claim 8, wherein the bipolar function selector is configured to select the functions of the electrodes such that both the internal electrode and the external electrode perform the electrostatic chuck function in a second semiconductor process mode.