# US 11,906,907 B2 · Apparatus and method for determining a condition associated with a pellicle > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 11,906,907 B2 - Document ID: US11906907B2 - Status: Granted - Kind: B2 - Application number: 16/765,339 - Filed: 2018-11-27 - Published: 2020-10-29 - Granted: 2024-02-20 - Earliest claimed: 2017-12-12 - Assignees: ASML Netherlands B.V.; ASML Holding N.V. - Applicants: Asml Netherlands B.V.; Asml Holding N.V. - Inventors: Derk Servatius Gertruda Brouns; Joshua Adams; Aage Bendiksen; Richard Jacobs; Andrew Judge; Veera Venkata Narasimha Narendra Phani Kottapalli; Joseph Harry Lyons; Theodorus Marinus Modderman; Manish Ranjan; Marcus Adrianus Van De Kerkhof; Xugang Xiong - Web page: https://patentgrep.com/patent/US11906907B2 ## CPC - G03F 7/7085: {Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load} - G03F 1/62: Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof - G03F 1/64: characterised by the frames, e.g. structure or material, including bonding means therefor - G03F 7/70033: {by plasma extreme ultraviolet [EUV] sources} - G03F 7/70891: {Temperature} - G03F 7/70983: {Optical system protection, e.g. pellicles or removable covers for protection of mask} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition. ## Claims ### Claim 1 An apparatus for determining a condition associated with a pellicle for use in a lithographic tool, the apparatus comprising a sensor configured to detect infrared radiation (IR) emitted from a region of the pellicle illuminated or arranged to be illuminated by the lithographic tool, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of a pellicle condition and to measure the pellicle when mounted in relation to an object it is designed to protect, wherein the sensor is configured to substantially avoid measurement of infrared radiation from the object and/or the apparatus is configured to determine the condition by substantially avoiding measurement of infrared radiation from the object. ### Claim 2 (depends on 1) The apparatus according to claim 1, wherein the property associated with the pellicle is a temperature or a temperature profile of the pellicle and/or a temperature or a temperature profile of a particle on the pellicle. ### Claim 3 (depends on 1) The apparatus according to claim 1, wherein the sensor is configured to measure an IR emission differential. ### Claim 4 (depends on 1) The apparatus according to claim 1, wherein the sensor is configured to filter out signals other than signals from an inspection plane, wherein the inspection plane corresponds to the location of the pellicle. ### Claim 5 (depends on 1) The apparatus according to claim 1, wherein the sensor is configured to measure the property associated with the pellicle when the pellicle is in a radiation beam exposure position in the lithographic tool. ### Claim 6 (depends on 1) The apparatus according to claim 1, wherein the condition associated with the pellicle is one or more selected from: lifetime of the pellicle, integrity of the pellicle, a defect in the pellicle, a local transmission change of the pellicle, a particle located on the pellicle, a stain on the pellicle, a deformation of the pellicle, an impending rupture of the pellicle, a rupture of the pellicle, and/or the presence of the pellicle. ### Claim 7 (depends on 1) An assembly comprising the apparatus according to claim 1 and a lithographic tool, the lithographic tool comprising: a support structure constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto the substrate. ### Claim 8 (depends on 1) The apparatus according to claim 1, wherein the sensor is configured to substantially avoid measurement of infrared radiation from the object and does so by being located at an angle of incidence of at least 45 degrees with respect to the pellicle to suppress infrared radiation from the object. ### Claim 9 (depends on 1) The apparatus according to claim 1, wherein the apparatus is configured to determine the condition by substantially avoiding measurement of infrared radiation from the object and does so by considering only infrared radiation within a certain blackbody wavelength range associated with the pellicle. ### Claim 10 (depends on 1) The apparatus according to claim 1, wherein the sensor is configured to locate a particle on the pellicle by identifying a contrast between the infrared radiation being received from the particle and the pellicle. ### Claim 11 (depends on 1) The apparatus according to claim 1, wherein the sensor comprises a photodiode that is configured to provide a bias voltage that is scannable to establish an IR emission spectrum. ### Claim 12 (depends on 1) The apparatus according to claim 1, configured to activate a split exposure scheme based on the measured property. ### Claim 13 A method of determining a condition associated with a pellicle for use in a lithographic apparatus, the method comprising detecting, using a sensor, infrared radiation (IR) emitted from a region of the pellicle illuminated or arranged to be illuminated by the lithographic tool while the pellicle is mounted in relation to an object it is designed to protect and measuring, based on the detected infrared radiation, a property associated with the pellicle, the property being indicative of the pellicle condition, wherein the sensor is configured to substantially avoid measurement of infrared radiation from the object and/or the condition associated with the pellicle is determined by substantially avoiding measurement of infrared radiation from the object. ### Claim 14 (depends on 13) The method of claim 13, wherein the sensor is configured to measure an IR emission differential. ### Claim 15 (depends on 13) The method of claim 13, further comprising filtering out signals other than signals from an inspection plane, wherein the inspection plane corresponds to the location of the pellicle. ### Claim 16 (depends on 13) The method of claim 13, wherein the condition associated with the pellicle is one or more selected from: lifetime of the pellicle, integrity of the pellicle, a defect in the pellicle, a local transmission change of the pellicle, a particle located on the pellicle, a stain on the pellicle, a deformation of the pellicle, an impending rupture of the pellicle, a rupture of the pellicle, and/or the presence of the pellicle. ### Claim 17 (depends on 13) The method of claim 13, wherein the sensor is configured to substantially avoid measurement of infrared radiation from the object and does so by being located at an angle of incidence of at least 45 degrees with respect to the pellicle to suppress infrared radiation from the object. ### Claim 18 (depends on 13) The method of claim 13, wherein the condition associated with the pellicle is determined by substantially avoiding measurement of infrared radiation from the object and done so by considering only infrared radiation within a certain blackbody wavelength range associated with the pellicle. ### Claim 19 (depends on 13) The method of claim 13, comprising locating a particle on the pellicle by identifying a contrast between the infrared radiation being received from the particle and the pellicle. ### Claim 20 (depends on 13) The method of claim 13, wherein the sensor comprises a photodiode that is configured to provide a bias voltage that is scannable to establish an IR emission spectrum.