# US 11,906,698 B2 · Broadband achromatic flat optical components by dispersion-engineered dielectric metasurfaces

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- Number: US 11,906,698 B2
- Document ID: US11906698B2
- Status: Granted
- Kind: B2
- Application number: 16/692,551
- Filed: 2019-11-22
- Published: 2020-03-26
- Granted: 2024-02-20
- Earliest claimed: 2017-05-24
- Assignees: The Trustees of Columbia University in the City of New York
- Applicants: The Trustees of Columbia University In the City of New York
- Inventors: Nanfang Yu; Adam Overvig; Sajan Shrestha
- Web page: https://patentgrep.com/patent/US11906698B2

## CPC

- G02B 1/002: {made of materials engineered to provide properties not available in nature, e.g. metamaterials}
- G02B 1/02: made of crystals, e.g. rock-salt, semi-conductors (G02B1/08 takes precedence)
- G02B 5/1842: {Gratings for image generation (G02B5/1847 takes precedence)}
- G02B 5/1857: {using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams}
- G02B 5/1871: {Transmissive phase gratings}
- G02B 27/0037: {with diffracting elements (G02B27/0056 takes precedence; holographic optical elements G02B5/32; zone systems G02B5/1876)}
- G02B 27/4211: {correcting chromatic aberrations (G02B27/0056, G02B27/4222, G02B27/4227 take precedence)}
- B82Y 20/00: Nanooptics, e.g. quantum optics or photonic crystals
- G02B 2207/101: Nanooptics
- G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES

## Abstract

Techniques for creating a replacement for optical elements with diffractive planar components based on metasurfaces are provided. In one example, a substantially flat optical component for lensing incoming electromagnetic radiation having at least one wavelength and a first phase into outgoing electromagnetic radiation having a second phase is provided.

## Claims

### Claim 1

A substantially flat optical component for lensing incoming electromagnetic radiation having at least one wavelength and a first phase into outgoing electromagnetic radiation having a second phase, comprising:
a transparent substrate; and
at least one metasurface, coupled to the substrate, comprising a plurality of optical meta-units to change at least the first phase to the second phase, wherein the plurality of optical meta-units comprises a plurality of singular pillars, a plurality of annular pillars, and a plurality of concentric rings, wherein each of the plurality of meta-units comprises silicon or TiO2;
wherein each optical meta-unit of the plurality of optical meta-units is positioned at a distance that is less than the wavelength from at least a different optical meta-unit;
wherein the flat optical component is adapted to correct both chromatic and monochromatic aberrations across the wavelength;
wherein each of the plurality of meta-units comprises a meta-unit having a shape to diffractively scatter the electromagnetic radiation;
wherein the shape comprises an archetype shape having one or more varying geometrical parameters; and
wherein each of the plurality of meta-units is configured to provide a range of optical phase offset and phase dispersion for a broadband achromatic metasurface lens.

### Claim 2 (depends on 1)

The system of claim 1, wherein the at least one metasurface comprises two or more metasurfaces.

### Claim 3 (depends on 2)

The system of claim 2, wherein the two or more metasurfaces are adapted to correct for the monochromatic aberrations.

### Claim 4 (depends on 1)

The system of claim 1, wherein the at least one metasurface comprises a first and a second layer.

### Claim 5 (depends on 4)

The system of claim 4, wherein the first layer comprises a first geometry and a first material, and the second layer comprises a second geometry and/or a second material.

### Claim 6 (depends on 1)

The system of claim 1, wherein each of the plurality of meta-units is configured to provide a range of scattering amplitude for a broadband achromatic metasurface lens.

### Claim 7 (depends on 1)

The system of claim 1, wherein the at least one metasurface is characterized by a varying thickness.

### Claim 8 (depends on 1)

The system of claim 1, wherein the phase profile of the optical meta-units is defined by:
Φ
⁢
1
=
∑
s
n
=
1
An
⁡
(
P
R
⁢
1
)
2
⁢
n
,
wherein p=√{square root over (x2+y2)} is a radial coordinate, x and y are position coordinates of the optical meta-units with respect to an origin of the x-y plane of the metasurface, R1 is a radius of the metasurface, and coefficient An is an optimization parameter.

### Claim 9

A method of making a substantially flat optical component for lensing incoming electromagnetic radiation having at least one wavelength and a first phase into outgoing electromagnetic radiation having a second phase, comprising:
positioning a transparent substrate; and
forming at least one metasurface on the substrate comprising a plurality of optical meta-units to change at least the first phase to the second phase, wherein the plurality of optical meta-units comprises a plurality of singular pillars, a plurality of annular pillars, and a plurality of concentric rings, wherein each of the plurality of meta-units comprises silicon or TiO2;
wherein each optical meta-unit of the plurality of optical meta-units is positioned at a distance that is less than the wavelength from at least a different optical meta-unit;
wherein the flat optical component is adapted to correct both chromatic and monochromatic aberrations across the wavelength;
wherein each of the plurality of meta-units comprises a meta-unit having a shape to diffractively scatter the electromagnetic radiation;
wherein the shape comprises an archetype shape having one or more varying geometrical parameters; and
wherein each of the plurality of meta-units is configured to provide a range of optical phase offset and phase dispersion for a broadband achromatic metasurface lens.

### Claim 10 (depends on 9)

The method of claim 9, wherein the forming comprises forming a substrate layer and a patterned film layer thereon having a thickness between 100 and 100,000 nm.

### Claim 11 (depends on 10)

The method of claim 10, wherein the patterning is selected from the group consisting of using electron-beam lithography, photolithography, deep ultra-violet lithography, and imprint lithography.

### Claim 12 (depends on 9)

The method of claim 9, wherein the forming comprises stacking two or more patterned film layers.

### Claim 13 (depends on 9)

The method of claim 9, wherein the meta-units is selected from the group consisting of silicon, silicon nitride, gallium nitride, or titanium dioxide.

### Claim 14 (depends on 9)

The method of claim 9, wherein the forming further comprises partially embedding the meta-units in the substrate.

### Claim 15 (depends on 9)

The method of claim 9, wherein the meta-units comprise meta-units having varying shapes along at least a height direction.

### Claim 16 (depends on 9)

The method of claim 9, wherein the meta-units vary in height.