# US 11,906,367 B2 · Substrate temperature sensor, substrate retainer and substrate processing apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 11,906,367 B2 - Document ID: US11906367B2 - Status: Granted - Kind: B2 - Application number: 17/185,408 - Filed: 2021-02-25 - Published: 2021-06-17 - Granted: 2024-02-20 - Earliest claimed: 2018-09-18 - Assignees: Kokusai Electric Corporation - Applicants: Kokusai Electric Corporation - Inventors: Tokunobu Akao; Hitoshi Murata; Akinori Tanaka; Masaaki Ueno - Web page: https://patentgrep.com/patent/US11906367B2 ## CPC - G01K 1/146: {arrangements for moving thermometers to or from a measuring position} - H10P 72/3312: {Vertical transfer of a batch of workpieces} - G01K 1/026: {arrangements for monitoring a plurality of temperatures, e.g. by multiplexing} - G01K 1/14: Supports; Fastening devices; Arrangements for mounting thermometers in particular locations - G01K 1/143: for measuring surface temperatures - H10P 72/0434: {mainly by convection} - H10P 72/0602: {Temperature monitoring} - H10P 74/203: {Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects} - G01K: MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR (radiation pyrometry G01J5/00) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract According to one aspect of the technique, there is provided a substrate temperature sensor configured to measure a temperature of a substrate, wherein the substrate temperature sensor is provided in a protective pipe passing through a notch provided at least in a bottom plate of a substrate retainer inserted into a process chamber in a state where the substrate is mounted on the substrate retainer. ## Claims ### Claim 1 A substrate temperature sensor configured to measure a temperature of a substrate, wherein the substrate temperature sensor is provided in a protective pipe passing through a notch provided at least in a bottom plate of a substrate retainer inserted into a process chamber in a state where the substrate is mounted on the substrate retainer. ### Claim 2 (depends on 1) The substrate temperature sensor of claim 1, wherein the substrate temperature sensor is capable of being rotated together with the substrate when the substrate retainer is being rotated. ### Claim 3 (depends on 1) The substrate temperature sensor of claim 1, comprising a cable provided along a support column of the substrate retainer. ### Claim 4 (depends on 1) The substrate temperature sensor of claim 1, comprising a cable inserted in a support column of the substrate retainer. ### Claim 5 A substrate retainer configured to be inserted into a process chamber in a state where a substrate is mounted on the substrate retainer, comprising a protective pipe passing through a notch provided at least in a bottom plate of the substrate retainer and capable of accommodating a substrate temperature sensor configured to measure a temperature of the substrate. ### Claim 6 (depends on 5) The substrate retainer of claim 5, wherein the substrate temperature sensor comprises: a temperature meter configured to measure the temperature of the substrate; and a cable comprising a wire constituting the temperature meter. ### Claim 7 (depends on 5) The substrate retainer of claim 5, wherein the protective pipe is installed in vicinity of a support column of the substrate retainer. ### Claim 8 (depends on 5) The substrate retainer of claim 5, wherein the protective pipe is of a crank shape. ### Claim 9 (depends on 5) The substrate retainer of claim 5, further comprising: a substrate holder comprising a substrate processing region in which the substrate is accommodated; a heat insulating plate holder comprising a heat insulating region in which a heat insulating plate is accommodated; and a base provided with a notch at a lower end thereof, wherein the protective pipe extends laterally along the notch as a guide thereof, and extends upward from an outer circumference of the heat insulating plate holder. ### Claim 10 (depends on 9) The substrate retainer of claim 9, wherein a thickness of the base is greater than an outer diameter of the protective pipe. ### Claim 11 A substrate processing apparatus comprising: a process chamber in which a substrate is accommodated; a substrate temperature sensor configured to measure a temperature of the substrate; a protective pipe configured to accommodate the substrate temperature sensor; and a substrate retainer in which the protective pipe passes through a notch provided at least in a bottom plate thereof. ### Claim 12 (depends on 11) The substrate processing apparatus of claim 11, further comprising a rotator configured to rotate the substrate retainer, and wherein the substrate temperature sensor is capable of being rotated together with the substrate retainer while the substrate retainer is being rotated by the rotator. ### Claim 13 (depends on 11) The substrate processing apparatus of claim 11, further comprising a transmitter provided under the rotator, capable of being rotated together with the substrate while the substrate retainer is being rotated by the rotator, and connected to the substrate temperature sensor at a location outside the process chamber. ### Claim 14 (depends on 13) The substrate processing apparatus of claim 13, further comprising: a receiver configured to receive a signal output from the transmitter; and a controller connected to the receiver, wherein the transmitter is configured to convert an input signal into a digital signal and to wirelessly transmit the digital signal in a radio wave to the receiver by modulating the radio wave according to the digital signal. ### Claim 15 (depends on 14) The substrate processing apparatus of claim 14, wherein the receiver is configured to receive the digital signal output from the transmitter, to convert the digital signal into an analog signal and to output the analog signal to the controller. ### Claim 16 (depends on 14) The substrate processing apparatus of claim 14, further comprising a transfer chamber provided adjacent to the process chamber, wherein the receiver is provided at an inner wall of the transfer chamber distanced apart from the transmitter provided at a boundary between the process chamber and the transfer chamber.