# US 11,906,246 B2 · Organic film forming apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 11,906,246 B2 - Document ID: US11906246B2 - Status: Granted - Kind: B2 - Application number: 16/899,767 - Filed: 2020-06-12 - Published: 2020-10-01 - Granted: 2024-02-20 - Earliest claimed: 2017-12-15 - Assignees: Shibaura Mechatronics Corporation - Applicants: Shibaura Mechatronics Corporation - Inventors: Yukinobu Nishibe; Akinori Iso; Keigo Oomori; Takashi Takahashi - Web page: https://patentgrep.com/patent/US11906246B2 ## CPC - F27B 17/00: Furnaces of a kind not covered by any of groups F27B1/00 - F27B15/00 (structural combinations of furnaces F27B19/02) - C23C 14/56: Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks - F26B 3/30: from infrared-emitting elements {(by radiation emanating from passages containing heated fluids other than combustion gases F26B23/10)} - F26B 9/06: in stationary drums or chambers - F27B 5/04: adapted for treating the charge in vacuum or special atmosphere - F27B 5/14: Arrangements of heating devices - F27D 7/06: Forming or maintaining special atmospheres or vacuum within heating chambers (supplying steam, vapour, gases or liquids F27D7/02) - G02F 1/1303: {Apparatus specially adapted to the manufacture of LCDs} - F27B: FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - F26B: DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM (drying devices for combines A01D41/133; racks for drying fruit or vegetables A01F25/12; drying foodstuffs A23; drying hair A45D20/00; body-drying implements A47K10/00; drying household articles A47L; drying gases or vapours B01D; chemical or physical processes for dewatering or like separating liquids from solids B01D43/00; centrifugal apparatus B04; drying ceramics C04B33/30; drying yarns or fabrics in association with some other form of treatment D06C; drying frames for laundry without heating or positive air circulation, domestic laundry-or spin-driers, wringing or hot pressing laundry D06F; furnaces, kilns, ovens F27) - F27D: DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE - G02F: OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS ## Abstract According to one embodiment, an organic film forming apparatus includes a chamber configured to maintain an atmosphere more reduced than an atmospheric pressure, at least one processing room provided inside the chamber and being surrounded by a cover, and an exhaust part configured to exhaust the inside the chamber. The processing room includes an upper heating part including first heaters, a lower heating part including second heaters, and facing the upper heating part, an upper heat equalizing plate provided on the lower heating part side of the upper heating part, a lower heat equalizing plate provided on the upper heating part side of the lower heating part, and workpiece supporters configured to support a workpiece through a gap between the upper and lower heat equalizing plates. ## Claims ### Claim 1 An organic film forming apparatus, comprising: a chamber configured to maintain an atmosphere more reduced than an atmospheric pressure; at least one processing room provided inside the chamber and being surrounded by a cover; and an exhaust part configured to exhaust the inside the chamber, the processing room including an upper heating part including a plurality of first heaters provided to be arranged in a predetermined direction, the plurality of first heaters having a rod shape, a lower heating part including a plurality of second heaters provided to be arranged in the predetermined direction, facing the upper heating part, and the plurality of second heaters having a rod shape, an upper heat equalizing plate provided on the lower heating part side of the upper heating part, a gap being provided between an upper surface of the upper heat equalizing plate and the lower surfaces of the first heaters, a lower heat equalizing plate provided on the upper heating part side of the lower heating part, a gap being provided between an lower surface of the lower heat equalizing plate and the upper surfaces of the second heaters, a plurality of workpiece supporters configured to support a workpiece through a gap between the upper heat equalizing plate and the lower heat equalizing plate, the workpiece including a substrate and a solution including polyamic acid coated on an upper surface of the substrate, the workpiece supporters being rod-shaped bodies, an upper heat equalizing plate supporter detachably supporting the upper heat equalizing plate, and a lower heat equalizing plate supporter detachably supporting the lower heat equalizing plate, wherein the upper heat equalizing plate includes one pair of holders facing in a direction orthogonal to a direction along which the plurality of first heaters are arranged, a plurality of the upper heat equalizing plate supporters are fixed to the pair of holders, the upper heat equalizing plate includes a bent portion, the heat equalizing plate supporter includes a bent portion protruding toward the upper heat equalizing plate, when a tip of the bent portion of the heat equalizing plate supporter contacts a lower surface of the upper heat equalizing plate, a tip of the bent portion of the upper heat equalizing plate does not contact the heat equalizing plate supporter, and when the tip of the bent portion of the heat equalizing plate supporter does not contact the lower surface of the upper heat equalizing plate, the tip of the bent portion of the upper heat equalizing plate contacts the heat equalizing plate supporter, the processing room having a space communicating with the chamber, the exhaust part reducing a pressure inside the chamber, and reducing a pressure of a space between an inner wall of the chamber and the cover. ### Claim 2 (depends on 1) The apparatus according to claim 1, wherein the processing room is provided in a plurality to overlap in a vertical direction, and the upper heating part provided in the processing room of the lower side serves as the lower heating part provided in the processing room of the upper side. ### Claim 3 (depends on 1) The apparatus according to claim 1, wherein in the predetermined direction, a side heat equalizing plate is further provided in each of side parts of both sides of the processing room, and the side heat equalizing plate is provided inside the cover. ### Claim 4 (depends on 3) The apparatus according to claim 3, wherein the chamber has openings facing each other, in a direction orthogonal to the predetermined direction, a side heat equalizing plate is further provided on each of both sides of the processing room, and the side heat equalizing plate is provided inside a lid closing one of the openings and inside a door closing one other of the openings. ### Claim 5 (depends on 3) The apparatus according to claim 3, further comprising: at least one third heater provided between the side heat equalizing plate and the cover to be separated from the side heat equalizing plate and the cover. ### Claim 6 (depends on 3) The apparatus according to claim 3, further comprising: a supporter detachably supporting the side heat equalizing plate. ### Claim 7 (depends on 1) The apparatus according to claim 1, wherein the upper heat equalizing plate and the lower heat equalizing plate include at least one of aluminum, copper, or stainless steel. ### Claim 8 (depends on 7) The apparatus according to claim 7, wherein when the upper heat equalizing plate and the lower heat equalizing plate include the copper, a layer including nickel is provided on a surface. ### Claim 9 (depends on 1) The apparatus according to claim 1, wherein a distance between a surface of the first heater and the upper heat equalizing plate is same as a distance between a surface of the second heater and the lower heat equalizing plate. ### Claim 10 (depends on 1) The apparatus according to claim 1, wherein the cover has function of reflecting a heat incident from the upper heating part side or the lower heating part side to the processing room side. ### Claim 11 An organic film forming apparatus comprising: a chamber configured to maintain an atmosphere more reduced than an atmospheric pressure; at least one processing room provided inside the chamber and being surrounded by a cover; and an exhaust part configured to exhaust the inside the chamber, the processing room including an upper heating part including a plurality of first heaters provided to be arranged in a predetermined direction, the plurality of first heaters having a rod shape, a lower heating part including a plurality of second heaters provided to be arranged in the predetermined direction, facing the upper heating part, and the plurality of second heaters having a rod shape, an upper heat equalizing plate provided on the lower heating part side of the upper heating part, a gap being provided between an upper surface of the upper heat equalizing plate and the lower surfaces of the first heaters, a lower heat equalizing plate provided on the upper heating part side of the lower heating part, a gap being provided between an lower surface of the lower heat equalizing plate and the upper surfaces of the second heaters, a side heat equalizing plate provided in each of side parts of both sides of the processing room in the predetermined direction, a side heat equalizing plate provided on each of both sides of the processing room in a direction orthogonal to the predetermined direction, a plurality of workpiece supporters configured to support a workpiece through a gap between the upper heat equalizing plate and the lower heat equalizing plate, the workpiece including a substrate and a solution including polyamic acid coated on an upper surface of the substrate, the workpiece supporters being rod-shaped bodies, and an upper heat equalizing plate supporter detachably supporting the upper heat equalizing plate and provided in the processing room, wherein the upper heating part includes a pair of holders facing in a direction orthogonal to a direction along which the plurality of first heaters are arranged, a plurality of the upper heat equalizing plate supporters are fixed to the pair of holders, the upper heat equalizing plate includes a bent portion, the heat equalizing plate supporter includes a bent portion protruding toward the upper heat equalizing plate, when a tip of the bent portion of the heat equalizing plate supporter contacts a lower surface of the upper heat equalizing plate, a tip of the bent portion of the upper heat equalizing plate does not contact the heat equalizing plate supporter, when the tip of the bent portion of the heat equalizing plate supporter does not contact the lower surface of the upper heat equalizing plate, the tip of the bent portion of the upper heat equalizing plate contacts the heat equalizing plate supporter, the workpiece supported by the workpiece supporters in the processing room being surrounded in all directions by the upper heat equalizing plate, the lower heat equalizing plate and the side heat equalizing plates. ### Claim 12 (depends on 11) The apparatus according to claim 11, wherein a distance between a surface of the first heater and the upper heat equalizing plate is same as a distance between a surface of the second heater and the lower heat equalizing plate. ### Claim 13 (depends on 11) The apparatus according to claim 11, wherein the cover has function of reflecting a heat incident from the upper heating part side or the lower heating part side to the processing room side.