US 11,903,239 B2 · Display device, and method for manufacturing display device

Abstract

A display device includes the following: a base substrate; a light-emitting element on the base substrate with a TFT layer interposed therebetween, the light-emitting element forming a display region; a sealing film covering the light-emitting element and having a stack of, in sequence, first and second inorganic insulating films; a frame region surrounding the display region; a cut disposed in the frame region so as to partly cut the display region; a cut-peripheral wall disposed in the frame region between the display region and the cut, and extending along the boundary of the display region; an evaporated film between the cut-peripheral wall and the first inorganic insulating film; and an organic buffer layer disposed on a surface of the cut-peripheral wall and interposed between the first and second inorganic insulating films.

Claims20

Dependent claims

A display device comprising:

a base substrate;
a light-emitting element disposed on the base substrate with a TFT layer interposed between the base substrate and the light-emitting element, the light-emitting element forming a display region;
a sealing film covering the light-emitting element, the sealing film comprising a stack of, in sequence, a first inorganic insulating film and a second inorganic insulating film;
a frame region surrounding the display region;
a cut disposed in the frame region so as to partly cut the display region;
a cut-peripheral wall disposed in the frame region between the display region and the cut, and extending along the boundary of the display region;
an evaporated film disposed between the cut-peripheral wall and the first inorganic insulating film;
and
an organic buffer layer disposed on a surface of the cut-peripheral wall and interposed between the first and second inorganic insulating films, wherein
the organic buffer layer is partly in contact with the cut-peripheral wall.

7 more elements

A method for manufacturing a display device, comprising the steps of:

forming a TFT layer onto a base substrate;
forming a light-emitting element onto the TFT layer, the light-emitting element forming a display region;
forming a sealing film over the light-emitting element;
forming a cut in a frame region by partly cutting the frame region and the display region, the frame region surrounding the display region;
and
forming, in the frame region between the display region and the cut, a cut-peripheral wall along a boundary of the display region, the step of forming the cut-peripheral wall being performed before the step of forming the sealing film,
wherein the step of forming the sealing film includes
a step of forming a first inorganic insulating film over the light-emitting element,
a step of forming an organic film over the first inorganic insulating film through evaporation,
a step of ashing the organic film to form an organic buffer layer onto a surface of the cut-peripheral wall, and
a step of forming a second inorganic insulating film over the first inorganic insulating film and the organic buffer layer.

8 more elements

Dependencies are inferred from the claim text.

Display device, and method for manufacturing display device

Life of this patent

Display device, and method for manufacturing display device

Life of this patent

Abstract

Claims20