Cathode arc source, filters thereof and method of filtering macroparticles
AssigneeNanofilm Technologies International Limited
InventorsXu Shi, Ming Chu Yang, Kok How Tan
Life of this patent
Estimating the term…
Abstract
A filter (104a, 104b, 108) for a cathode arc source comprises: a filter duct having at least one bend (104a, 104b), and a first magnetic field source for steering plasma through the filter duct for removal of macroparticles from the plasma; wherein the apparatus comprises a second magnetic field source (108) which is rotatably mounted surrounding a portion of the filter duct. Cathode arc sources (102) and cathode arc deposition apparatuses (106) comprise the filters described herein, and methods of filtering macroparticles from a beam of plasma emitted from a cathode arc source use the filters.
Claims16
A filter for a cathode arc source, said filter comprising:
- a filter duct having two bends, and
- a first magnetic field source for steering plasma through the filter duct for removal of macroparticles from the plasma, wherein the first magnetic field source comprises a coil of a conducting material wrapped around the filter duct along 50% or greater of its length;
- wherein the filter comprises a second magnetic field source which is rotatably mounted surrounding a portion of the filter duct between the two bends.
A filter for a cathode arc source, said filter comprising:
- a filter duct having a bend of an angle of greater than 90°, and
- a first magnetic field source for steering plasma through the filter duct for removal of macroparticles from the plasma, wherein the first magnetic field source comprises a coil of a conducting material wrapped around the filter duct along 50% or greater of its length;
- wherein the filter comprises a second magnetic field source which is rotatably mounted surrounding a portion of the filter duct downstream of the bend.
Dependencies are inferred from the claim text.