Plasma processing system and edge ring replacement method
AssigneeTokyo Electron Limited
InventorsShin Matsuura, Kenichi Kato
Life of this patent
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AssigneeTokyo Electron Limited
InventorsShin Matsuura, Kenichi Kato
Estimating the term…
A plasma processing system includes a control device. The control device executes raising a lifter to deliver a cover ring supporting an edge ring to the lifter; moving a jig supported by a holder to a space between the cover ring and a substrate support surface/an annular support surface; raising a different lifter to deliver the jig to the different lifter; extracting the holder, and then moving the lifter and the different lifter relatively to deliver the edge ring to the jig; lowering only the lifter to deliver the cover ring to the annular member support surface; moving the holder to a space between the cover ring and the jig, and then lowering the different lifter to deliver the jig to the holder; and extracting the holder from the processing chamber to transfer the jig supporting the edge ring from the processing chamber.
A plasma processing system comprising:
An edge ring replacement method in a plasma processing system, the plasma processing system including
Dependencies are inferred from the claim text.