Plasma processing method, plasma processing apparatus, and control apparatus

A plasma processing apparatus comprising:

• a rotary table rotatably provided in a vacuum container and configured to dispose a plurality of substrates on an upper surface thereof along a circumferential direction;
• a gas supply source configured to supply a plasma processing gas to at least one of a plurality of processing areas separated by a separation area in the circumferential direction of the rotary table;
• an antenna provided to face the upper surface of the rotary table and configured to generate plasma in the at least one processing area;
• and
• a controller,
• wherein the controller is configured to execute a process including:
• placing the plurality of substrates on the upper surface of the rotary table;
• supplying the plasma processing gas into the vacuum container and supplying a continuous wave of RF power to the antenna while rotating the rotary table;
• and
• supplying the plasma processing gas into the vacuum container and supplying a pulsed wave of RF power to the antenna while rotating the rotary table.