Stochastic-aware lithographic models for mask synthesis
AssigneeSynopsys, Inc.
InventorsKevin Dean Lucas, Yudhishthir Prasad Kandel, Ulrich Welling, Ulrich Karl Klostermann, Zachary Adam Levinson
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Abstract
In some aspects, a mask pattern is accessed. The mask pattern is for use in a lithography process that prints a pattern on a wafer. The mask pattern is applied as input to a deterministic model of the lithography process to predict a characteristic of the printed pattern. The deterministic model is deterministic, but it accounts for local stochastic variations of the characteristic in the printed pattern.
Claims19
A method comprising:
- accessing a mask pattern for use in a lithography process that prints a pattern on a wafer;
- and
- applying, by a processor, the mask pattern to a deterministic model of the lithography process to predict a characteristic of the printed pattern that is subject to local stochastic variations, comprising:
- applying the mask pattern to a deterministic compact model that predicts the characteristic of the printed pattern, wherein the compact model does not account for local stochastic variations of the characteristic;
- and
- applying a deterministic correction to the predicted characteristic from the compact model, wherein the correction accounts for the local stochastic variations of the characteristic in the printed pattern.
A system comprising:
- a memory storing instructions;
- and
- a processor, coupled with the memory and to execute the instructions, the instructions when executed cause the processor to perform operations comprising:
- accessing a mask pattern for use in a lithography process that prints a pattern on a wafer;
- and
- applying the mask pattern to a deterministic model of the lithography process to predict a characteristic of the printed pattern that is subject to local stochastic variations, wherein the deterministic model comprises (a) a deterministic compact model that predicts the characteristic of the printed pattern but does not account for the local stochastic variations of the characteristic, and (b) a deterministic correction to the predicted characteristic from the compact model that accounts for the local stochastic variations of the characteristic in the printed pattern.
A non-transitory computer readable medium comprising stored instructions, which when executed by a processor, cause the processor to perform operations comprising:
- accessing a mask pattern for use in a lithography process that prints a pattern on a wafer;
- and
- applying the mask pattern to a deterministic model of the lithography process to predict a characteristic of the printed pattern that is subject to local stochastic variations, wherein the deterministic model comprises (a) a deterministic compact model that predicts the characteristic of the printed pattern but does not account for the local stochastic variations of the characteristic, and (b) a deterministic correction to the predicted characteristic from the compact model that predicts the characteristic of the printed pattern as a function of model properties that include at least one stochastic model property that correlates to the local stochastic variations of the predicted characteristic.
Dependencies are inferred from the claim text.